研究目的
To develop a simple and efficient approach to synthesize luminescent form of silicon called porous silicon and compatible with traditional silicon technologies for microLED displays.
研究成果
Highly uniform and ultrathin high porosity nanoporous silicon films can be fabricated under very low current densities and fluorine ion concentration in a reproducible manner, suitable for microLED displays.
研究不足
The use of high current densities and high concentrations of hydrofluoric acid in the electrochemical etching process leads to short process times and the use of toxic, aggressive reagents.
1：Experimental Design and Method Selection:
Electrochemical anodization of silicon to form nanoporous silicon layers and electrochemical anodizing of thin aluminum films to produce nanomesh aluminum films.
2：Sample Selection and Data Sources:
Antimony doped silicon substrate and thin aluminum layers.
3：List of Experimental Equipment and Materials:
Scanning electron microscope Hitachi S4800, electrolyte consisting of HF, H3PO4, and C2H5OH.
4：Experimental Procedures and Operational Workflow:
Formation of nanoporous silicon layers at low current densities and low HF concentrations, fabrication of nanomesh aluminum films by anodizing.
5：Data Analysis Methods:
SEM imaging for structural analysis, spectrometer for photoluminescence and electroluminescence measurements.
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