1：Experimental Design and Method Selection:

The study used PLD to produce ZnO thin films on microscope slide glass substrates at room temperature. The PLD system included a vacuum chamber, rotating sample and substrate holders, optical thickness measurement system, infrared temperature measurement system, and a nanosecond laser system.

2：Sample Selection and Data Sources:

Microscope slide glass was used as a substrate. ZnO sputter target (99.99% purity) was used for deposition. Oxygen gas was used as a reactant.

3：99% purity) was used for deposition. Oxygen gas was used as a reactant. List of Experimental Equipment and Materials:

3. List of Experimental Equipment and Materials: PLD chamber (DUO20M/HiPace700, Pfeiffer Vacuum, Germany), laser system (Minilite II, Continuum, USA), infrared non-contact thermometer (3MH1-CF3, Optris, Turkey), reflectance measurement system (MProbe In-Situ, Semiconsoft, USA), Atomic Force Microscopy (AFM), X-Ray Diffraction (XRD) method, UV-VIS Spectrometer (V-670, Jasco Corp., Japan), z-scan system.

4：Experimental Procedures and Operational Workflow:

The vacuum chamber was evacuated down to ~10-8 mbar before deposition. Deposition was carried out at about 1.3×10-1 mbar oxygen background gas pressure. The thicknesses of the films were deduced from reflectance measurement and crosschecked with profilometer and AFM measurements.

5：3×10-1 mbar oxygen background gas pressure. The thicknesses of the films were deduced from reflectance measurement and crosschecked with profilometer and AFM measurements. Data Analysis Methods:

5. Data Analysis Methods: The crystallinity of thin films was investigated using XRD. The thicknesses of the films were measured using a fitting software and crosschecked with profilometer and AFM measurements. Linear optical properties were obtained using UV-VIS Spectrometer. Nonlinear optical properties were obtained by the z-scan method.