研究目的
Investigating the fabrication and performance of ultrathin all-2D lateral graphene/GaS/graphene UV photodetectors by direct CVD growth.
研究成果
The study successfully demonstrated the fabrication of ultrathin all-2D lateral graphene/GaS/graphene UV photodetectors with high sensitivity to UV light, a low detection limit, and fast response time. The results highlight the potential of using large band gap 2D semiconductors like GaS for the development of next-generation 2D optoelectronics.
研究不足
The study is limited by the challenges in post-processing GaS-based devices and the need for further optimization of the CVD growth conditions to improve the uniformity and performance of the photodetectors.
1:Experimental Design and Method Selection:
The study utilized chemical vapor deposition (CVD) methods to grow large band gap layered GaS between graphene electrode pairs directly. The use of prepatterned graphene electrode pairs on the Si wafer enabled the fabrication of more than 200 devices simultaneously.
2:Sample Selection and Data Sources:
The samples were prepared by patterning graphene electrode pairs on SiO2/Si chips, followed by the selective deposition of GaS in the gaps between graphene electrodes using a CVD process.
3:List of Experimental Equipment and Materials:
A single zone system with a 1 in. diameter quartz tube was used for the CVD growth. Ga2S3 powder was used as the precursor, and the growth was performed under ambient pressure with a mixture of H2/Ar gas.
4:Experimental Procedures and Operational Workflow:
The CVD growth involved three stages: flushing the system with Ar gas, heating the Ga2S3 precursor in a H2-rich atmosphere, and fast cooling to room temperature. The growth time was varied to investigate the growth mechanism of GaS.
5:Data Analysis Methods:
The electronic and optoelectronic properties of the fabricated devices were characterized using I?V measurements under different light excitations. Raman spectroscopy and atomic force microscopy (AFM) were used to determine the quality and thickness of the GaS film.
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JEOL 5500 FS EBL system
5500 FS
JEOL
Used for patterning graphene ribbons by electron beam lithography.
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Thorlab LED370E
LED370E
Thorlab
Used as a light source for blue light (centered 375 nm) in photodetection measurements.
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Thorlab M275L4
M275L4
Thorlab
Used as a UV light source (centered 275 nm) in photodetection measurements.
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Keithley 2400 source meter
2400
Keithley
Used for conducting I?V, I?Vg, and transient characterization of the devices.
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LabRAM Aramis Raman spectrometer
Aramis
LabRAM
Used for Raman measurements to determine the quality and thickness of the GaS film.
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