研究目的
Investigating the effects of oxygen content on the photoelectrochemical properties of LaFeO3 perovskite thin films obtained by pulsed laser deposition.
研究成果
The study demonstrates that the oxygen partial pressure during PLD significantly influences the structural and photoelectrochemical properties of LaFeO3 thin films. Optimal oxygen content leads to high-quality crystalline structure and enhanced photoelectrochemical performance.
研究不足
The study is limited to the effects of oxygen partial pressure on the properties of LaFeO3 thin films. The findings may not be directly applicable to other perovskite materials or deposition methods.
1：Experimental Design and Method Selection:
The study involved the deposition of LaFeO3 thin films on Nb:SrTiO3 substrates using pulsed laser deposition (PLD) at different oxygen partial pressures. The structural, morphological, and photoelectrochemical properties of the films were analyzed.
2：Sample Selection and Data Sources:
LaFeO3 thin films were prepared at oxygen partial pressures of 5 × 10?2, 0.25, 0.3, 0.6, and 0.9 mbar.
3：25, 3, 6, and 9 mbar.
List of Experimental Equipment and Materials:
3. List of Experimental Equipment and Materials: An ArF excimer laser (193 nm) was used for PLD. High-resolution X-ray diffraction (HRXRD), X-ray photoelectron spectroscopy (XPS), atomic force microscopy (AFM), and photoelectrochemical (PEC) measurements were employed for characterization.
4：Experimental Procedures and Operational Workflow:
Films were deposited at 750 °C substrate temperature. The structural properties were analyzed using HRXRD, surface morphology by AFM, and chemical composition by XPS. PEC measurements were performed in an alkaline aqueous solution of NaOH.
5：Data Analysis Methods:
The structural data were analyzed using Williamson–Hall-type approaches. Photocurrent values were measured to evaluate the water splitting performance.
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