研究目的
To improve and control the crystal growth of PbI2 film and p-PbI2/MWCNTs/p-Si photodetector by finding the optimum laser fluence.
研究成果
The study successfully demonstrated the growth of nanostructured PbI2 films by PLD at 45°C, with optimal properties achieved at a laser fluence of 3.9 J/cm2. The p-PbI2/MWCNTs/p-Si photodetector prepared under these conditions showed high photosensitivity without post-deposition annealing, indicating potential for high-performance optoelectronic applications.
研究不足
The study is limited by the dependence of film properties on laser fluence and the need for further optimization of the PLD process for better film quality and photodetector performance.
1:Experimental Design and Method Selection:
The study used pulsed laser deposition (PLD) technique to grow nanostructured PbI2 films at a substrate temperature of 45°C, investigating the effect of laser fluence on film properties.
2:Sample Selection and Data Sources:
High purity PbI2 powder was pressed into pellets for PLD. Glass and single-crystal silicon substrates were used.
3:List of Experimental Equipment and Materials:
A home-made PLD system with a Q-switched Nd:YAG laser, X-ray diffractometer (XRD-6000, Shimadzu), SEM (T-scan Vega III Czech), AFM (Digital Instruments Nanoscope II), and UV-Vis spectrophotometer were used.
4:Experimental Procedures and Operational Workflow:
PbI2 films were deposited at various laser fluences, followed by structural, morphological, optical, and electrical characterization.
5:Data Analysis Methods:
XRD, SEM, AFM, EDX, and UV-Vis data were analyzed to determine film properties.
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