研究目的
Investigating the interaction of Cr/Ag metal thin films with infra-red laser to enhance their electrical, optical, and morphological properties for optoelectronic devices.
研究成果
Laser treatment significantly improves the electrical and optical properties of Cr/Ag thin films, with the best results observed at 165 mJ laser energy. This process also reduces surface roughness, enhancing the films' suitability for optoelectronic applications.
研究不足
The study is limited to the effects of laser treatment on Cr/Ag thin films under specific conditions (N2 ambient, certain laser energies). Further optimization and exploration of other conditions or materials could enhance the findings.
1：Experimental Design and Method Selection:
DC magnetron sputtering was used to deposit Cr and Ag thin films on silicon and glass substrates. Laser treatments were performed at different energies under N2 ambient.
2：Sample Selection and Data Sources:
Silicon and glass substrates were chosen for their properties relevant to optoelectronic applications.
3：List of Experimental Equipment and Materials:
DC magnetron sputtering system, Nd:YAG laser, UV-Vis spectrometer, atomic force microscopy (AFM) system.
4：Experimental Procedures and Operational Workflow:
Deposition of Cr/Ag thin films, laser treatment at varying energies, characterization of electrical, optical, and morphological properties.
5：Data Analysis Methods:
Electrical resistivity, sheet resistance, and conductivity were measured. Optical properties were analyzed using UV-Vis spectrometer. Surface morphology was examined using AFM.
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