研究目的
Investigating the surface smoothing of poly(methyl methacrylate) (PMMA) film by laser induced photochemical etching under various conditions of laser wavelength, power, and inlet gas.
研究成果
The study demonstrated that PMMA film surfaces can be smoothened by laser irradiation, with etching characteristics strongly dependent on laser wavelength, power density, and the presence of O2 molecules. Short wavelength lasers (325 nm) resulted in higher etch rates, while longer wavelengths (532 nm) had no effect. The necessity of O2 molecules for etching was confirmed by the lack of etching under vacuum conditions.
研究不足
The study was limited to PMMA films and specific laser wavelengths. The mechanism of energy up-conversion and the upper limit of laser wavelength for effective etching are not fully understood.
1：Experimental Design and Method Selection:
The study involved irradiating PMMA films with lasers of different wavelengths (325, 405, and 532 nm) under O2 and vacuum conditions to observe etching characteristics.
2：Sample Selection and Data Sources:
PMMA films were prepared by spin-coating on Si substrates and patterned by nanoimprinting to create sharp bumps for enhanced smoothing effect.
3：List of Experimental Equipment and Materials:
He–Cd laser (325 nm), InGaN laser (405 nm), DPSS laser (532 nm), atomic force microscopy (AFM), scanning electron microscope (SEM).
4：Experimental Procedures and Operational Workflow:
PMMA samples were irradiated for 3 hours under specified conditions, and line profiles before and after irradiation were measured by AFM.
5：Data Analysis Methods:
The etch rates were calculated based on the height differences observed in the AFM line profiles.
独家科研数据包，助您复现前沿成果，加速创新突破
获取完整内容
