研究目的
Investigating the deposition of high-performance DLC films on Si substrates using femtosecond pulsed laser deposition, with methods of oxygen ambient and mixing silicon to improve transmission, hardness, and adhesion.
研究成果
Femtosecond pulsed laser deposition, combined with oxygen ambient and silicon mixing, effectively improves the transmission, hardness, and adhesion of DLC films on Si substrates. The films meet the requirements for optical engineering applications.
研究不足
The study focuses on the deposition of DLC films on Si substrates and their optical and mechanical properties. The scalability of the method for large-area deposition and the cost-effectiveness of the femtosecond laser system are potential limitations.
1：Experimental Design and Method Selection:
Femtosecond pulsed laser deposition was used to deposit DLC films on Si substrates. Methods of oxygen ambient and mixing silicon were employed to enhance film properties.
2：Sample Selection and Data Sources:
n-type single crystal Si (100) substrates were used.
3：List of Experimental Equipment and Materials:
Ti:Sapphire femtosecond laser (800nm, 120fs, 1000Hz,
4：3W), graphite target, oxygen gas. Experimental Procedures and Operational Workflow:
The laser beam was focused onto a graphite target in a vacuum chamber with or without oxygen ambient. Silicon slices were mixed into the DLC film by sticking them onto the graphite target.
5：Data Analysis Methods:
Infrared transmission spectrum, hardness tests, and stability tests (high temperature, low temperature, salt-fog, and heavy-friction) were conducted.
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