研究目的
Investigating the size-dependent photoresponse characteristics and low-frequency noise behavior of high-speed germanium nanocrystals (nc-Ge) photodetector.
研究成果
The nc-Ge photodetectors show size-dependent photoresponse with the highest responsivity, lowest NEP, and highest detectivity observed for nc-Ge synthesized at 900 ?C. The devices exhibit fast response times, making them suitable for high-speed optoelectronic applications compatible with silicon technology.
研究不足
The study is limited to the temperature range of 800 ?C–900 ?C for annealing and does not explore lower or higher temperatures. The impact of interface defects on device performance is noted but not fully quantified.
1:Experimental Design and Method Selection:
The nc-Ge embedded in SiO2 matrix with different sizes were synthesized by annealing the cosputtered Ge-SiO2 thin films at 800 ?C–900 ?C. Raman spectroscopy and UV–Vis-near-infrared response (NIR) spectrophotometer were used for characterization.
2:Sample Selection and Data Sources:
p-type Si Wafers were used as substrates.
3:List of Experimental Equipment and Materials:
RF-sputtering system, Raman spectroscopy (Horiba Jobin Yvon Raman Lab RAM HR 800 Evolution), UV–Vis-near-infrared response (NIR) spectrophotometer (Perkin Elmer Lambda 1050), RF magnetron sputtering for ITO deposition.
4:Experimental Procedures and Operational Workflow:
Ge and SiO2 were code-posited on p-type Si Wafers using RF-sputtering. Samples were annealed in N2 ambient. ITO was deposited as top contact, and Al as bottom contact.
5:Data Analysis Methods:
Responsivity, NEP, and detectivity were calculated from the measured data.
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