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Laser-induced damage of black glass before and after surface treatment by containing impurities-SiO2 film during ultra clean manufacturing

DOI:10.1016/j.jclepro.2020.120360 期刊:Journal of Cleaner Production 出版年份:2020 更新时间:2025-09-19 17:13:59
摘要: Ultra-clean manufacturing is an indispensable key technology for inertial confinement fusion (ICF) to generate clean and sustainable energy, but the pollutants from laser-induced damage are a threat to ultra-clean manufacturing. Here we investigate the damage of black glass in a high laser fluence system, which refers to high fluence laser beams in fusion class laser systems. Results show a significant dependence of damage parameters on the laser pulse duration at 355 nm before and after surface treatment by SiO2 films, which include the laser-induced damage threshold (LIDT), morphology and depth. The simulation indicates that the LIDT of SiO2 films on black glass is improved obviously, which is 14.1 J/cm2, while that of normal black glass is 10.2 J/cm2. The presence of impurities will aggravate the damage of the thin films and pollutes the laser system. LIDT of SiO2 films containing impurities is only 3.6 J/cm2. The experiments show that the average LIDT of black glass is 9.54 J/cm2 while that of thin films with impurities is no more than 4.12 J/cm2. These salient results provide a new concept for the protection of absorbing stray light for ultra-clean manufacturing.
作者: Jiaheng Yin,Yongzhi Cao,Yongda Yan,Lihua Lu,Jiaxuan Chen,Fuli Yu
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To investigate the damage of black glass in a high laser fluence system before and after surface treatment by SiO2 films, focusing on the laser-induced damage threshold (LIDT), morphology, and depth, and to analyze the effect of impurities on the damage of the films.

The study concludes that coating black glass with SiO2 films can improve its ability to absorb stray light, but the presence of impurities in the films drastically reduces the LIDT. The damage mechanism involves thermal melting and stress-induced failure due to impurities. The findings suggest that reducing impurities is crucial for improving the LIDT of thin films in ultra-clean manufacturing processes.

The presence of impurities in the films significantly reduces the LIDT, indicating a need for methods to reduce impurity introduction during film preparation. The study also highlights the technical constraints of achieving ultra-clean manufacturing in laser systems.

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