研究目的
Investigating the robust and large valley splitting in a gate-defined single quantum dot hosted in molecular-beam-epitaxy-grown 28Si/SixGe1?x and its tunability by gate voltages, as well as the spin relaxation mechanisms at different magnetic fields.
研究成果
The study demonstrates a robust and large valley splitting in a gate-defined single quantum dot in 28Si/SixGe1?x, which is tunable by gate voltages. The spin relaxation time T1 exceeds 1 s at low magnetic fields and is limited by valley hotspot and phonon noise at higher fields. The findings provide a promising perspective for higher-yield spin qubit devices in Si/SixGe1?x quantum dots.
研究不足
The study is limited by the specific heterostructure and device configuration used, which may not be generalizable to all silicon-based quantum dots. The analysis of spin relaxation mechanisms at low magnetic fields requires more statistics and higher magnetic field resolution for unambiguous identification of the dominant noise source.
1:Experimental Design and Method Selection:
The study involves the characterization of a single-electron spin qubit in MBE-grown isotopically purified 28Si/SixGe1?x using pulsed gate spectroscopy and the magneto-dependence of the spin relaxation time T1. The dot-defining gate layout allows for lateral displacement of the quantum dot by changing gate voltages while keeping its size and orbital energy constant.
2:The dot-defining gate layout allows for lateral displacement of the quantum dot by changing gate voltages while keeping its size and orbital energy constant.
Sample Selection and Data Sources:
2. Sample Selection and Data Sources: The device is a double quantum dot (DQD) with an integrated nanomagnet, fabricated on an undoped 28Si quantum well with 60 ppm of residual 29Si. The heterostructure is grown by solid-source MBE.
3:List of Experimental Equipment and Materials:
The device includes a 20-nm layer of Al2O3 for insulation, depletion gates fabricated by electron beam lithography, and a Co nanomagnet for providing a local magnetic field gradient. Measurements are conducted in an Oxford Triton dilution refrigerator at a base temperature of 40 mK.
4:Experimental Procedures and Operational Workflow:
The device is tuned to the single-electron regime, and the spin relaxation time T1 is measured as a function of external magnetic field. Pulsed gate spectroscopy is used to characterize the device, and the spin relaxation rate is analyzed to determine the valley splitting.
5:Data Analysis Methods:
The spin relaxation rate is fitted with a rate equation including spin-valley and spin-orbit coupling mechanisms, combined with Johnson and phonon noise.
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