研究目的
Investigating the distribution and electrical activity of p-type doping (Mg) in gallium nitride (GaN) grown by metal organic chemical vapor deposition.
研究成果
The correlation between APT and electron holography has allowed the direct link between the nm-scale spatial distribution and the electrical activity of Mg dopants in GaN nanostructure as a function of the total concentration that is incorporated during growth. The highest concentration of Mg that is potentially active is observed in the region with a concentration of 7 × 1019 cm?3. The dopant concentration of 2 × 1020 cm?3 has the most efficient p-type activity despite having the highest density of Mg-rich clusters.
研究不足
The study was limited by the difficulty in comparing small changes in electrostatic potential when examining different TEM specimens separately by off-axis electron holography. Additionally, the evaporation of the GaN layer with a dopant concentration of 3 × 1019 cm?3 was never observed because of systematic tip ruptures.
1:Experimental Design and Method Selection:
The study employed atom probe tomography (APT) and off-axis electron holography to investigate the distribution and electrical activity of Mg dopants in GaN.
2:Sample Selection and Data Sources:
A wafer containing differently doped layers was grown by metal organic chemical vapor deposition (MOCVD) on a n-type doped GaN substrate.
3:List of Experimental Equipment and Materials:
CAMECA FlexTAP for APT, FEI Titan Ultimate for HAADF-STEM, FEI Titan Themis TEM for off-axis electron holography.
4:Experimental Procedures and Operational Workflow:
TEM lamella and needle-shaped atom probe specimens were prepared using a dual-beam focused ion beam (FIB). APT was performed under low electric field conditions. Off-axis electron holography was performed at 400 °C to increase the carrier concentration.
5:Data Analysis Methods:
The data from APT and electron holography were correlated to understand the distribution and electrical activity of Mg dopants.
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