研究目的
Investigating the mismatch measurement for small capacitors, specifically a 2-fF poly–insulator–poly (PIP) capacitor, to enable low-energy applications in analog integrated circuits.
研究成果
Direct mismatch measurement of small capacitors is feasible and can be used for capacitors of different types. The mismatch of a 2-fF PIP capacitor has been directly measured, showing better mismatch compared to MOM capacitors implemented in a deep submicron 32-nm process. This indicates that smaller feature size and lateral field capacitors do not necessarily match better, particularly when comparing capacitors of different types and from different technologies.
研究不足
The mismatch of small capacitors is higher than what is estimated from Pelgrom’s model, indicating increased mismatch due to edge effects. The study is limited to a 0.35-μm CMOS process and may not directly apply to other technologies without further investigation.