研究目的
Investigating the controlled growth of monolayer and bilayer MoS2 flakes via CVD method and their application in high-performance photodetectors.
研究成果
Monolayer and bilayer MoS2 flakes were successfully synthesized with clean surfaces by controlling the solution precursor, and their applications in photodetectors were explored. The photodetectors based on MoS2 flakes exhibit excellent performance in air, including a responsivity of 7160 A W?1, a maximum detectivity value of 2.44×1011 Jones, and a fast response/recovery time of 97 ms/291 ms.
研究不足
The study focuses on the controlled growth of monolayer and bilayer MoS2 flakes and their application in photodetectors. The limitations include the specific conditions required for the synthesis and the focus on MoS2, which may not be directly applicable to other TMDs without further research.
1：Experimental Design and Method Selection:
Chemical vapor deposition (CVD) method was used to synthesize monolayer and bilayer MoS2 flakes with a solution precursor.
2：Sample Selection and Data Sources:
MoS2 flakes were directly synthesized on SiO2/Si substrates.
3：List of Experimental Equipment and Materials:
Optical microscopy (OLIMPUS, BX51M-N53MF2), atomic force microscope (AFM, Bruker Multimodel-8), high-resolution LCM system, K-Alpha XPS system, semiconductor analyzer (Keithley 4200-SCS).
4：Experimental Procedures and Operational Workflow:
The substrate was etched in H2O2 and H2SO4 at 90 oC for 50 min before deposition. The furnace was pumped down to vacuum and filled up with Ar. The substrate temperature was heated to 750 oC with Ar gas flow increased to 100 SCCM.
5：Data Analysis Methods:
The thickness of the flakes was characterized by AFM and high-resolution LCM system. XPS spectra were measured to confirm the chemical compositions and states.
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