1：Experimental Design and Method Selection:

The films were deposited by a combinatorial PLD (c-PLD) method using a KrF* excimer laser source. The deposition was conducted by simultaneous ablation of two targets (an un-doped phosphate glass and CdSe of 99.99% purity) at a residual pressure of 2 × 10?4 Pa.

2：99% purity) at a residual pressure of 2 × 10?4 Pa. Sample Selection and Data Sources:

2. Sample Selection and Data Sources: All the samples were deposited at room temperature on double-sided polished (100) silicon substrates.

3：List of Experimental Equipment and Materials:

KrF* excimer laser source, beam splitter, spectrophotometer (Perkin Elmer Lambda 1050), ellipsometry (UVISEL Horiba Jobin–Yvon device), spectrofluorometer (Horiba Jobin–Yvon Nanolog 3), LABRAM-HR 800 Horiba Jobin–Yvon spectrometer, Bruker D8 Advance device, Perkin Elmer Spectrophotometer-Spectrum 100, micro-Raman LabRAM HR 800, Gemini 500 Carl Zeiss scanning electron microscope, XE100 model from the Park System for AFM.

4：Experimental Procedures and Operational Workflow:

The laser beam was divided into two by means of a beam splitter. The laser repetition rate was 10 Hz. The target-to-substrate separation distance was set at 60 mm. Laser pulses of 10,000 and 5000 were applied for the deposition of c-PLD and PLD films, respectively.

5：Data Analysis Methods:

Optical absorption spectra, photoluminescence emission, XRD spectrum, FTIR and Raman spectroscopy, SEM-EDX and AFM analyses.