研究目的
To demonstrate how cracked film lithography (CFL) can be used to pattern transparent conductive metal grids for solar cells, improving their efficiency by introducing macroscopic nonuniformities to balance shadowing, grid resistance, and transparent conductive oxide resistance losses.
研究成果
CFL can be used to fabricate high-performance transparent conductive metal grids for solar cells by introducing macroscopic nonuniformities. This approach matches the performance of optimized baseline grids in small area CIGS cells, achieving a 19.3%-efficient device. Simulations and calculations suggest that patterned CFL grids can significantly improve module efficiency by reducing TCO losses and enabling wider monoliths.
研究不足
The study is limited by the reproducibility of the CFL process near lift-off failure conditions and the need for further optimization of grid designs for larger area applications.
1：Experimental Design and Method Selection:
The study involved the fabrication of small area CIGS solar cells with CFL-patterned metal grids. The crack template thickness was systematically decreased to shift the T/Rsh,grid/wire spacing tradeoff to higher T, higher Rsh,grid, and lower wire spacing.
2：Sample Selection and Data Sources:
The cells were fabricated on soda-lime glass with a Mo back contact, CIGS absorber, CdS buffer, and Al:ZnO TCO.
3：List of Experimental Equipment and Materials:
Equipment included a DC sputtering system for Mo back contact, co-evaporation for CIGS, chemical bath deposition for CdS, RF sputtering for ZnO, and e-beam evaporation for metal grids. Materials included PMMA nanoparticle suspensions for crack templates.
4：Experimental Procedures and Operational Workflow:
The process involved coating substrates with PMMA crack templates, drying, metal deposition, lift-off, and device isolation.
5：Data Analysis Methods:
Performance was evaluated through JV measurements, and simulations were performed to estimate resistance in the TCO and grids.
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