研究目的
Investigating the third-order nonlinear optical (NLO) properties and optical limiting behavior of a novel chalcone derivative under continuous wave laser excitation.
研究成果
The FMC chalcone derivative exhibits promising third-order NLO properties and optical limiting behavior, making it a potential candidate for nonlinear optical device applications under continuous wave laser excitation.
研究不足
The study is limited to the characterization of third-order NLO properties under continuous wave laser excitation at 532nm wavelength and 200mW power. Potential areas for optimization include exploring other wavelengths and power levels.
1:Experimental Design and Method Selection:
The study utilized the Claisen-Schmidt condensation reaction method for synthesis and slow evaporation solution growth technique for crystal growth. The third-order NLO properties were studied using the single beam z-scan technique with a continuous wave DPSS laser.
2:Sample Selection and Data Sources:
The sample was a novel chalcone derivative (FMC) dissolved in DMF (
3:01m). List of Experimental Equipment and Materials:
Diode Pumped Solid State laser (DPSS), UV-Vis spectrophotometer (VARIAN, cary 50 Bio), quartz cuvette, and whatman filter paper.
4:Experimental Procedures and Operational Workflow:
The sample was scanned through the focal plane of a tightly focused Gaussian beam to measure nonlinear absorption and refraction coefficients.
5:Data Analysis Methods:
The data was analyzed using standard equations for nonlinear absorption coefficient (β), nonlinear refractive index (n2), and third-order susceptibility (χ(3)).
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