研究目的
To experimentally and theoretically evaluate the optical properties of a one-dimensional photonic crystal (PC) with a defect layer before and after an annealing procedure.
研究成果
The study demonstrated that the optical properties of a TeOx/SiO2 1D PC with a defect layer can be significantly altered by thermal annealing, leading to a shift in the reflectance spectra towards longer wavelengths and a reduction in the photonic bandgap width. The findings suggest potential applications in photonic devices where tunable optical properties are desired.
研究不足
The study is limited to the evaluation of optical properties of 1D PCs with a specific defect layer and does not explore the effects of varying other structural parameters or materials.
1：Experimental Design and Method Selection:
The study used a sputtering technique with high index (TeOx) and low index (SiO2) materials to fabricate the 1D PC with a defect layer. The optical properties were evaluated before and after an annealing procedure.
2：Sample Selection and Data Sources:
Single layer TeOx and SiO2 thin films were prepared and characterized. The 1D PC was fabricated on p-type Si (100) wafer and fused quartz substrates.
3：List of Experimental Equipment and Materials:
RF magnetron sputtering system, XPS, EDX, XRD, UV-VIS-NIR spectrophotometer, SEM, FE-SEM.
4：Experimental Procedures and Operational Workflow:
The thin films were deposited at room temperature, annealed in nitrogen at 200 °C, and characterized using various techniques to evaluate their optical and structural properties.
5：Data Analysis Methods:
The optical constants were determined using the envelope method from transmittance spectra. The reflectance spectra were compared with simulations using the transfer matrix method (TMM).
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X-Ray Diffraction
PANalytical, X'Pert PRO
PANalytical
Used for structurally characterizing the TeOx single layer.
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Scanning electron microscopy
Hitachi, S-4700
Hitachi
Used for measuring the surface quality of the TeOx single layer.
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Field emission scanning electron microscopy
JEEOL, JSM-7500F
JEEOL
Used for verifying the microstructure, periodicity and thickness of the 1D PC.
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RF magnetron sputtering system
Used for fabricating the 1D PC with a defect layer.
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X-ray photoelectron spectroscopy
VG, Multilab-2000
VG
Used for characterizing the binding energy of the TeOx single layer.
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Energy dispersive X-ray spectroscopy
Horiba, EX-200
Horiba
Used for characterizing the composition of the TeOx single layer.
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Ultraviolet visible near-infrared spectrophotometer
Varian, Cary-500
Varian
Used for measuring the transmittance and reflectance spectra.
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