研究目的
Investigating the oxidation of epitaxial silicene on Ag(111) and its stability under ambient conditions.
研究成果
Epitaxial silicene on Ag(111) is fully oxidized after exposure to 100 L of molecular oxygen, leading to the formation of silicon oxide crystallites and oxidation of the silver substrate. This contradicts previous theoretical predictions of silicene's protective effect on the silver surface.
研究不足
The study is limited by the high chemical reactivity of epitaxial silicene, which restricts ex situ studies under ambient conditions. The presence of domain boundaries and defects within the silicene layer may also affect the results.
1：Experimental Design and Method Selection:
The study employs X-ray photoemission spectroscopy (XPS) and in situ Raman spectroscopy to monitor the oxidation of epitaxial silicene on Ag(111).
2：1). Sample Selection and Data Sources:
2. Sample Selection and Data Sources: Silicene samples are prepared under UHV conditions via thermal Si desorption from a Si wafer and adsorption on clean Ag(111) surfaces.
3：List of Experimental Equipment and Materials:
Equipment includes a triple monochromator Dilor XY800 spectrometer for Raman measurements, an ESCALAB 250Xi for XPS measurements, and an Agilent AFM 5500 for AFM imaging.
4：Experimental Procedures and Operational Workflow:
Oxidation is performed by exposure to molecular oxygen, monitored in situ by Raman spectroscopy after incremental oxidation dosages.
5：Data Analysis Methods:
Core level spectra are analyzed by numerical fitting of Voigt functions, and Raman spectra are smoothed and baseline-corrected.
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