研究目的
Investigating the structure and protective properties of silicon films deposited in a magnetron discharge with liquid target on different substrates at various conditions.
研究成果
Silicon coatings deposited at the bias voltages of -600 V and +100 V had a dense structure and demonstrated the best protective properties against both the corrosion in acids and high-temperature oxidation. The maximum achieved deposition rate of 1.2 μm/min (at +100 V bias) was much higher than that obtained in a conventional magnetron discharge with solid target.
研究不足
The destruction of the coatings during tests may be caused by the presence of large number of through channels in the coatings and poor adhesion of the coatings to the substrate.
1：Experimental Design and Method Selection:
Silicon coatings were deposited on mirror-polished plates made of low-carbon steel, high-carbon steel, and tungsten foils in a DC magnetron discharge with liquid cathode. The substrates were ultrasonically cleaned and sputter-cleaned prior to deposition. The coatings were deposited under various DC bias voltages.
2：Sample Selection and Data Sources:
Substrates used were low-carbon steel (transformer steel type 3), high-carbon steel (C1035), and 50 μm tungsten foils.
3：List of Experimental Equipment and Materials:
PINCH installation with a silicon target (99.9% purity) in a carbon crucible, SEM TESCAN VEGA3 for structure investigation.
4：9% purity) in a carbon crucible, SEM TESCAN VEGA3 for structure investigation.
Experimental Procedures and Operational Workflow:
4. Experimental Procedures and Operational Workflow: Deposition was performed under various DC bias voltages at a sample holder (-600V, -450V, -300V, -150V, 0V, +100V). The structure of deposited films was investigated by SEM.
5：Data Analysis Methods:
The film thickness was measured from SEM observations, and deposition rates were estimated by dividing the coating thickness by the deposition time.
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