研究目的
Investigating the efficiency of H3BO3 for controlled reduction of graphene oxide (GO) and finding the optimal conditions for the reduction of GO used in energy, optical, electronic and sensor devices.
研究成果
The reduction of GO in the H3BO3 melt is an effective process for the synthesis of rGO with less disrupted basal planes of graphene compared to thermal reduction of GO powder. The use of BA-glycerol chelate complex as a regioselective catalyst suppresses the formation of ketone C=O functional groups at vacancy sites, leading to materials with better structural, electrical, and electrochemical properties. The highest charge/discharge rate and double-layer capacitance were achieved for samples synthesized in the presence of glycerol and treated at 800 ?C.
研究不足
The study acknowledges the difficulty in controlling the extensive release of gaseous products during thermal treatment, which can lead to disruption of the graphene network. Additionally, the process of GO reduction in the melt of BA, while effective, requires further optimization for commercial applications.
1:Experimental Design and Method Selection:
The study employed a new method of GO reduction in the melt of boric acid (BA), using thermogravimetric analysis and differential scanning calorimetry (TG/DSC), scanning electron microscopy (SEM), Fourier-transform infrared (FTIR) spectroscopy, Raman spectroscopy, X-ray diffraction (XRD), and electrochemical measurements to characterize the synthesized materials.
2:Sample Selection and Data Sources:
GO was synthesized from natural graphite and reduced in the melt of H3BO3 with/without addition of L-ascorbic acid and glycerol.
3:List of Experimental Equipment and Materials:
Equipment included a Thermal analyser STA6000, ALPHA spectrometer, inVia Raman spectrometer, Hitachi SU-70 microscope, MiniFlex II diffractometer, and a Keithley 2601 Source Meter. Materials included graphite powder, H3BO3, L-ascorbic acid, and glycerol.
4:Experimental Procedures and Operational Workflow:
GO was reduced in the melt of H3BO3 at 300 ?C for 2 h and later at 400 ?C for 6 h. Some samples were further annealed at 800 ?C.
5:Data Analysis Methods:
Data were analyzed using GRAMS/AI 8.0 software for Raman spectra, and the Brunauer–Emmett–Teller model for surface area measurements.
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Thermal analyser STA6000
STA6000
PerkinElmer
Thermogravimetry/differential scanning calorimetry (TG/DSC) analysis
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ALPHA spectrometer
ALPHA
Bruker, Inc.
Recording FTIR spectra in transmission mode
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Hitachi SU-70 microscope
SU-70
Hitachi
Obtaining SEM images
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MiniFlex II diffractometer
MiniFlex II
Rigaku
Characterizing crystallographic information
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Keithley 2601 Source Meter
2601
Keithley
Conductivity measurement
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inVia Raman spectrometer
inVia
Renishaw
Recording Raman spectra
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TriStar II 3020
TriStar II 3020
Micromeritics
Measuring surface areas and pore volume distribution
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CompactStat potentiostate/galvanostate with impedance module
CompactStat
Ivium Technologies
Conducting cyclic voltammetry (CV) measurements
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