研究目的
Investigating the energy-level structure of Sn3+ ions in laser-produced plasma sources for extreme ultraviolet light generation in nanolithography.
研究成果
The study successfully identifies and verifies the energy levels of Sn3+ ions in a laser-produced plasma, refining the ionization limit and explaining the anomalous behavior of certain terms through advanced theoretical calculations. The findings contribute to the understanding of Sn plasma sources for nanolithography.
研究不足
The study is limited by the resolution of the spectrograph and the sensitivity of the CCD camera, especially in the ultraviolet range below 300 nm. The identification of weak lines and those with considerable scatter is challenging, with a risk of incorrect charge state ascription.
1:Experimental Design and Method Selection:
The study involves measuring the ultraviolet and optical spectrum from a droplet-based laser-produced Sn plasma using a spectrograph covering the range 200–800 nm. The method includes a masking technique to identify lines belonging to Sn3+ ions.
2:Sample Selection and Data Sources:
A stream of liquid tin microdroplets is ejected and irradiated by a pulsed Nd:YAG laser to generate a plasma. The emitted light is observed and recorded.
3:List of Experimental Equipment and Materials:
The setup includes a vacuum vessel, droplet generator, Nd:YAG laser, spectrograph (Princeton Isoplane SCT 320), and CCD camera (Princeton Pixis 2KBUV).
4:Experimental Procedures and Operational Workflow:
The laser energy is varied to study the dependence of spectral line intensities on laser energy. The light emitted from the plasma is imaged onto a quartz fiber guiding it to the spectrometer.
5:Data Analysis Methods:
The data analysis involves iterative guidance from COWAN code calculations and quantum-defect scaling to identify and verify the energy levels of Sn3+ ions.
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