研究目的
To develop a plate-to-roll nanoimprint lithography (P2RNIL) system for high-speed, large-scale, and high-resolution nanoimprint processes on flexible substrates, and to fabricate wire-grid polarizers and transparent metal electrodes with high performance.
研究成果
The P2RNIL system successfully fabricated high-performance wire-grid polarizers and transparent metal electrodes on flexible substrates, demonstrating its potential for the manufacture of flexible devices.
研究不足
The precision of the actuator is limited by grating ruler and can be controlled within 1μm. The maximum area which can get replicated in a single run with perfectly transferred patterns is about 15cm x 15cm.
1：Experimental Design and Method Selection:
Developed a P2RNIL system using a plate template and flexible substrates fed and retrieved by a roller-based system. A compliant mechanism was designed for passive alignment and minimizing lateral displacement between the template and substrate.
2：Sample Selection and Data Sources:
Used a 4-inch silicon wafer as the master template, fabricated nanoscale patterns using electron-beam lithography and plasma etching, and transferred patterns to a quartz wafer.
3：List of Experimental Equipment and Materials:
Included electron-beam lithography (JEOL 6300FS), inductive coupled plasma etching (ICP, Oxford ICP180), UV-curable resist (PhiChem, KY90F9-19), and spectrophotometer (SolidSpec-3700).
4：0).
Experimental Procedures and Operational Workflow:
4. Experimental Procedures and Operational Workflow: The imprinting process involved roller coating of UV-curable resist, alignment and imprinting using the P2RNIL system, UV curing, and demolding.
5：Data Analysis Methods:
Used finite element analysis (FEA) to verify the performance of the flexural joint and FDTD solutions to model the optical behavior of wire-grid polarizers.
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