研究目的
Understanding dynamic GaN device performance in dependence on targeted mission profile and technological parameters to provide an optimum design of high voltage power switching systems.
研究成果
The dynamic properties observed in GaN power switching transistors strongly depend on technology, biasing conditions, and temperature. Devices fabricated on epitaxial layers from different vendors depict very different performance, emphasizing the importance of understanding these interdependencies for power electronic circuit designers.
研究不足
The study highlights the complexity of dynamic device properties influenced by various parameters, indicating potential areas for optimization in device technology and epitaxial implementation.
1:Experimental Design and Method Selection:
The study involves analyzing dynamic switching properties of GaN power transistors under various biasing conditions, including off- and on-state time and voltage, substrate biasing conditions, and temperature.
2:Sample Selection and Data Sources:
GaN devices from different manufacturers and with different epitaxial structures were compared.
3:List of Experimental Equipment and Materials:
High voltage capacitor, resistive load switching setup, and GaN power transistors.
4:Experimental Procedures and Operational Workflow:
Devices were subjected to defined off-state bias times and voltages before being turned on, with the on-state resistance measured at specific times after switching.
5:Data Analysis Methods:
The dynamic on-state resistance was analyzed in relation to off-state bias voltage, time at off-state before turning on, and temperature.
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