研究目的
To prepare samples of As-Se-Te chalcogenide films with a high degree of chemical and structural uniformity using the PECVD approach.
研究成果
The PECVD method successfully prepared As-Se-Te chalcogenide films with high structural and chemical uniformity across a broad range of compositions, including those beyond the glass-forming region. The films exhibited low roughness and fine-grained structure, with optical properties dependent on composition. This work demonstrates the potential of PECVD for producing high-quality phase change materials.
研究不足
The study focuses on the preparation and initial characterization of As-Se-Te films. Further research is needed to explore their application in devices and to optimize the PECVD process for industrial scalability.
1：Experimental Design and Method Selection:
The PECVD method was chosen for its ability to produce high-quality phase change materials. The process involves the direct interaction of arsenic, selenium, and tellurium vapors in a low-temperature non-equilibrium RF plasma discharge at low pressure.
2：Sample Selection and Data Sources:
Elemental As, Se, and Te were used as precursors. High-pure argon served as the plasma feed and carrier gas.
3：List of Experimental Equipment and Materials:
Quartz reservoirs with external heaters, a quartz flask reactor with an external inductor, a stainless steel vacuum flange with a substrate holder, high-pure quartz glass, and sodium chloride substrates.
4：Experimental Procedures and Operational Workflow:
The precursors were supplied into the plasma discharge at a constant total rate of 30 ml/min. The substrate temperature was maintained at 5°C, with a deposition pressure of 0.1 Torr and reactor walls temperature of about 150°C. The plasma discharge was excited by an RF generator at 40 MHz and 30 W.
5：1 Torr and reactor walls temperature of about 150°C. The plasma discharge was excited by an RF generator at 40 MHz and 30 W.
Data Analysis Methods:
5. Data Analysis Methods: EDX analysis for macrocomposition, XRD for amorphous matter confirmation, AFM for surface roughness, Raman spectroscopy for structural analysis, and transmission/reflection spectra for optical properties.
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