研究目的
To investigate the degradation of natural organic matter responsible for the formation of trihalomethane (THM), haloacetic acid (HAA) and haloacetonitrile (HAN) during UV photolysis and a co-exposure of UV with chlorine (UV/chlorine) and chloramine (UV/chloramine).
研究成果
UV/chlor(am)ine processes are effective in controlling the formation of THM, HAA, and HAN, with UV/chloramine showing superior performance in reducing THM formation. The study highlights the potential of these processes in water treatment to minimize disinfection byproducts.
研究不足
The study did not explore the effects of longer UV exposures on HAA reduction. The reactivity of chlorine and chloramine with NOM intermediates and the optimization between chlorine dose and UV exposure were identified as areas for further research.
1：Experimental Design and Method Selection:
UV photolysis was conducted using LPUV and VUV lamps. UV/chlorine and UV/chloramine processes were tested with different doses and contact times.
2：Sample Selection and Data Sources:
Water samples were collected following coagulation, flocculation, sedimentation, and rapid sand filtration.
3：List of Experimental Equipment and Materials:
LPUV lamp (Aqua Rich Technology, Thailand), VUV lamp (Universal Lights Source, Inc., USA), DOC analyzer (TOC-V, Shimadzu), UV-Vis spectrophotometer (DR 4000U, Hach), gas chromatography with electron capture detector (GC-ECD).
4：Experimental Procedures and Operational Workflow:
Samples were exposed to UV photolysis and UV/chlor(am)ine treatments, with samples collected at various contact times for analysis.
5：Data Analysis Methods:
Pseudo first-order kinetic equations were used to analyze the degradation rates of THM, HAA, and HAN.
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