研究目的
Investigating the synthesis and performance of TiO2-IrOx alloys for enabling high photovoltages and catalyzing water oxidation on silicon metal-insulator-semiconductor (MIS) photoanodes, while imparting stability and inhibiting corrosion of the underlying silicon light absorber.
研究成果
TiO2-IrOx alloys synthesized by ALD are effective as corrosion-resistant Schottky contacts for silicon photoanodes, enabling high photovoltages and catalyzing water oxidation. The alloys demonstrated stability for 12 hours of continuous operation in acid, with no change in SiO2 thickness, indicating successful prevention of silicon oxidation. The study highlights the potential of ALD alloying for designing optimized electronic and materials properties for solar-driven water oxidation.
研究不足
The study notes that the current density decayed significantly over the first several hours of testing, possibly due to iridium loss at the alloy/electrolyte interface. Additionally, the catalytic activity of iridium is known to depend strongly on its oxidation state and chemical environment, which could affect long-term performance.
1：Experimental Design and Method Selection:
The study involved the synthesis of TiO2-IrOx alloys by atomic layer deposition (ALD) with precise control over the ratio of TiO2 to IrOx by varying the number of ALD cycles for each precursor. The alloys were characterized for their composition, conductivity, and performance in water oxidation.
2：Sample Selection and Data Sources:
Silicon substrates with a 2 nm surface SiO2 layer were used. The composition of the alloys was determined by X-ray photoelectron spectroscopy (XPS), and their thickness was measured by X-ray reflectivity (XRR).
3：List of Experimental Equipment and Materials:
ALD reactor, X-ray photoelectron spectrometer (PHI 5000 VersaProbeTM), X-ray diffractometer (PANalytical X’Pert), Biologic SP-200 potentiostat, and Auger electron spectrometer (PHI 700).
4：0).
Experimental Procedures and Operational Workflow:
4. Experimental Procedures and Operational Workflow: The alloys were deposited on silicon substrates, annealed in forming gas, and tested for water oxidation performance in various electrolytes. Electrochemical impedance spectroscopy (EIS) was used to analyze the MIS junction properties.
5：Data Analysis Methods:
The data were analyzed using CasaXPS software for XPS, PANalytical’s X’Pert reflectivity software for XRR, and equivalent circuit modeling for EIS data.
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