研究目的
To investigate the potentials of TiO2 thin films for device applications, focusing on the effects of post-deposition heat treatments on their optical properties.
研究成果
Nanocrystalline and single phase rutile TiO2 thin films prepared by CBD method exhibit direct transitions in the k-space. The energy band gaps increase with annealing temperatures, reaching a maximum of 2.2eV at 673K, making these films suitable for photonic device applications.
研究不足
The study focuses on the optical properties and does not extensively cover other properties such as electrical or mechanical characteristics of the TiO2 thin films. The range of annealing temperatures is limited to 373-673K.
1:Experimental Design and Method Selection:
Chemical Bath Deposition (CBD) technique was used to prepare nanocrystalline single phase rutile TiO2 thin films at a bath temperature range of 75-80°C.
2:Sample Selection and Data Sources:
TiO2 thin films were deposited on glass substrates using specific chemical solutions.
3:List of Experimental Equipment and Materials:
Elmer Lambda-2 spectrometer for optical characterization, Rigaku D/max 2100 diffractometer for XRD analysis, Scanning Electron Microscopy (SEM) for surface morphology, Rutherford Backscattering Spectrometry (RBS) for compositional analysis, and Quardpro301-Auto calculating four points probe for electrical properties.
4:Experimental Procedures and Operational Workflow:
Films were annealed at temperatures ranging from 373 to 673K to study the effects of thermal annealing on optical properties.
5:Data Analysis Methods:
Optical absorption studies were conducted to determine energy band gaps using spectrophotometric analysis.
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