研究目的
To determine the physical properties of graphene-doped ZnO nanocomposite thin films deposited by the thermionic vacuum arc technique, focusing on structural, optical, and morphological characteristics for potential applications as transparent conducting oxides.
研究成果
ZnO:Gr nanocomposite thin films deposited by TVA exhibit polycrystalline structure, reduced band gap (3.15 eV), smooth morphology, and lower resistivity on silicon substrates due to larger crystallite sizes. They show promise for use as transparent conducting oxides, with potential applications in optoelectronics.
研究不足
The study is limited to specific deposition conditions and substrates (glass and silicon); potential variations with other parameters or materials were not explored. The TVA technique may have constraints in scalability or reproducibility for industrial applications.
1：Experimental Design and Method Selection:
The study used the thermionic vacuum arc (TVA) technique for depositing thin films, chosen for its ability to produce pure, compact, and nanostructured films without buffer gases.
2：Sample Selection and Data Sources:
Graphene (NANOGRAFI, purity
3：99%, 5 nm thickness) and ZnO powder (SIGMA ALDRICH, purity 99%) were pressed into pellets and deposited onto glass and silicon substrates. List of Experimental Equipment and Materials:
TVA system with cathode and anode, vacuum chamber, Filmetrics F20 for thickness measurement, Unico UV-Vis spectrophotometer, Panalytical Empryan X-ray diffractometer, Renishaw inVia Raman spectrometer, Perkin Elmer 100 FTIR spectrometer, Perkin-Elmer LS-55 PL spectrometer, CarlZeiss Supra 55 FESEM, Ambios Q-scope AFM, Fluke 83III multimeter.
4：Experimental Procedures and Operational Workflow:
Pellets were placed in a molybdenum crucible, vacuum pumped to 9×10^-5 torr, plasma generated with filament current 18A, voltage 100V, discharge current
5：3A, deposition time 270 seconds. Films were analyzed using XRD, UV-Vis, Raman, FTIR, PL, FESEM, AFM, and resistivity measurements. Data Analysis Methods:
XRD data analyzed using Scherrer equation for crystallite size, dislocation density, and microstrain; optical band gap determined via Tauc plot; other analyses followed standard spectroscopic and microscopic techniques.
独家科研数据包，助您复现前沿成果，加速创新突破
获取完整内容-
X-ray diffractometer
Empryan
Panalytical
Used for microstructural analysis to investigate the crystalline phases and properties of the thin films.
-
FTIR spectrometer
100
Perkin Elmer
Used to analyze the chemical composition and bonding in the thin films via Fourier Transform Infrared spectroscopy.
-
PL spectrometer
LS-55
Perkin-Elmer
Used for photoluminescence measurements to determine optical properties and band gap emissions.
-
FESEM
Supra 55
CarlZeiss
Used for high-resolution surface imaging to examine the morphology and distribution of nanoparticles in the thin films.
-
AFM
Q-scope
Ambios
Used for surface characterization in non-contact mode to measure roughness and topography of the thin films.
-
Multimeter
83III
Fluke
Used to measure resistivity of the thin films at room temperature.
-
Graphene
5 nm thickness
NANOGRAFI
Used as a dopant material in the nanocomposite thin films to modify properties such as conductivity and optical characteristics.
-
ZnO powder
SIGMA ALDRICH
Base material for the thin film deposition, providing the zinc oxide component of the nanocomposite.
-
UV-Vis spectrophotometer
Unico
Used to measure optical transmittance and absorbance of the thin films in the wavelength range of 300–1100 nm.
-
Raman spectrometer
inVia
Renishaw
Used to analyze the chemical structure and composition via Raman spectroscopy with a 785 nm laser.
-
Thickness measurement apparatus
F20
Filmetrics
Used for in-situ monitoring and measurement of film thickness during deposition.
-
登录查看剩余9件设备及参数对照表
查看全部
