研究目的
To form copper nanofilms using the method of magnetron-assisted sputtering and study their microstructural and optical properties.
研究成果
Copper nanofilms exhibit microstructural and optical properties dependent on technological parameters. Island films on quartz substrates have statistically heterogeneous structures, necessitating statistical analysis for accurate parameter estimation. Optical spectra show bands at specific wavelengths (e.g., 0.25 μm, 0.32 μm, 0.48 μm) and plasma fluctuations, aligning with bulk copper properties. The results enable optimization of nanostructural systems for applications in optoelectronics and energy-saving technologies.
研究不足
The study is limited to copper nanofilms with thicknesses from 1 nm to 65 nm on specific substrates (quartz, glass, silicon). Optical measurements were conducted in air at room temperature, which may not account for environmental effects. The statistical heterogeneity of island films requires careful analysis to avoid errors. The spectral range is from 0.2 μm to 1.1 μm, not covering broader wavelengths.
1：Experimental Design and Method Selection:
Copper nanolayers were formed using direct current magnetron-assisted sputtering with a flat target. Technological parameters varied include substrate temperature, target-substrate distance, working gas pressure, and magnetron capacity.
2：Sample Selection and Data Sources:
Substrates used were quartz, silicate glass, and monocrystal silicon, prepared by standard techniques. Some samples underwent additional thermal processing at 300°C in vacuum.
3：List of Experimental Equipment and Materials:
Equipment includes a magnetron sputtering system, quartz resonator for thickness control, transmission and raster electron microscopy for structural study, electron diffraction for phase structure, and spectrophotometer SF-16 for optical measurements. Materials include copper target (mark 'm.v.'), argon gas, and substrates.
4：Experimental Procedures and Operational Workflow:
Films were deposited under varying pressures (
5：6-15 Pa) and magnetron capacities. Weight thickness was controlled via quartz resonator. After deposition, samples were analyzed using microscopy and spectrophotometry at room temperature in air. Data Analysis Methods:
Microstructural analysis involved statistical analysis of particle size distribution. Optical data (transmission and reflection coefficients) were measured with errors of ±1% for T and ±3% for R, and compared to known spectra.
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