研究目的
Investigating the effect of nitrogen modification on the photoelectrochemical water oxidation behavior of Bi2O3 semiconductor thin films to improve visible light absorption and photocatalytic activity.
研究成果
Nitrogen modification of Bi2O3 reduces band gap energy, increases photocurrent for water oxidation, enhances visible light absorption, and improves photocatalytic activity due to increased oxygen vacancies and reduced crystallite size, making it a promising material for photoelectrochemical applications.
研究不足
The study may have limitations in scalability for industrial applications, potential variability in synthesis conditions, and the need for further optimization of nitrogen doping levels and long-term stability tests.
1:Experimental Design and Method Selection:
The study used hydrothermal synthesis for Bi2O3 and N-modified Bi2O3 particles, followed by drop-casting and annealing to form thin films. Photoelectrochemical measurements, including linear sweep voltammetry and chronoamperometry, were conducted to assess water oxidation and dye decoloration.
2:Sample Selection and Data Sources:
Bismuth nitrate and urea were used as precursors; samples were prepared with and without nitrogen modification. Data were collected from UV-vis spectroscopy, XRD, SEM, EDS, and electrochemical tests.
3:List of Experimental Equipment and Materials:
Equipment includes Autolab 302 PG-stat, Xe-lamp, monochromator, UV-vis spectrophotometer, XRD, SEM, and EDS. Materials include Bi(NO3)3, urea, FTO-coated glass, and Rhodamine-B dye.
4:Experimental Procedures and Operational Workflow:
Hydrothermal synthesis at 160°C for 20 hours, drop-casting on FTO, annealing at 600°C, electrochemical measurements in buffer solutions under illumination, and photocatalytic dye degradation tests.
5:Data Analysis Methods:
Band gap calculation from UV-vis spectra using Tauc plot, crystallite size from XRD using Scherrer equation, carrier density from Mott-Schottky plots, and kinetic analysis for dye decoloration.
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Autolab 302 PG-stat
302
Metrohm
Used for photoelectrochemical measurements including linear sweep voltammetry and electrochemical impedance spectroscopy.
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UV-vis spectrophotometer
V-630
Jasco
Used for optical measurements to determine band gap energy from absorption spectra.
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X-ray diffractometer
Miniflex II
Rigaku
Used for XRD measurements to analyze crystallinity and phase composition.
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Scanning electron microscope
S4800 FESEM
JEOL
Used for SEM imaging to observe surface morphology of particles.
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Energy dispersive X-ray spectrometer
Oxford
Used for EDS analysis to determine elemental composition.
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Xe-lamp
Used as a light source for illumination in photoelectrochemical experiments.
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Monochromator
Oriel
Used to provide monochromatic light for action spectrum measurements.
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Optical power meter
Newport
Used to measure the power of incident light beams.
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FTO-coated glass
Xinyan Tech. Ltd.
Used as substrate for depositing semiconductor thin films.
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Teflon lined autoclave
SS304
Used for hydrothermal synthesis of semiconductor particles.
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