研究目的
To prepare highly crystalline Au incorporated In2O3 films with smooth, crack-free surface exhibiting intense luminescence emission properties so that they can be used for light emission applications.
研究成果
Au incorporated In2O3 films were successfully prepared with improved crystalline quality and intense UV luminescence. Au acts as a nucleation center, enhancing structural properties. Optical absorption is increased due to surface plasmon resonance, but transmittance decreases. Electrical properties are largely unchanged. The films show promise for UV light emission applications, with optimal performance at moderate Au concentrations.
研究不足
The study is limited to RF magnetron sputtered films on quartz substrates; other deposition methods or substrates may yield different results. Electrical properties are not significantly modified by Au incorporation, indicating potential limitations in electronic applications. Annealing effects are only studied for the 10 wt% Au film, not for all concentrations. The enhancement in UV emission is optimal only up to 3 wt% Au, beyond which concentration quenching occurs.
1:Experimental Design and Method Selection:
Au loaded In2O3 films were fabricated using RF magnetron sputtering technique at room temperature. Targets were prepared by mixing Au powder with In2O3 powder in different proportions. Films were deposited on quartz substrates in a vacuum chamber with specific base pressure, target-substrate distance, deposition duration, RF power, and argon gas pressure. Annealing was performed on selected films at different temperatures.
2:Sample Selection and Data Sources:
Films with Au loading concentrations of 0, 1, 3, 5, 7, and 10 wt% were prepared. A typical film with 10 wt% Au was annealed at 200, 300, and 400 °C.
3:List of Experimental Equipment and Materials:
Equipment includes X-ray diffractometer (Bruker AXS D8 Advance), micro-Raman spectrometer (Labram HR-800, Horiba Jobin Yvon), atomic force microscope (Bruker-Dimension edge), field emission scanning electron microscope (FEI-Nova Nano SEM 450), electron energy dispersive X-ray spectrometer (EDS-Quantax 200), X-ray photoelectron spectrometer (PHI 5000 VersaProbe II), UV-Visible spectrophotometer (JASCO, V-550), Hall measurement system (ECOPIA-HMS 5000), and spectrophotometer (Fluoromax-4, Horiba Jobin Yvon). Materials include Au powder, In2O3 powder (Sigma Aldrich purity 99.99%), and quartz substrates.
4:99%), and quartz substrates. Experimental Procedures and Operational Workflow:
4. Experimental Procedures and Operational Workflow: Films were deposited using RF magnetron sputtering with specified parameters. Annealing was done in a furnace at set temperatures. Structural analysis was performed using XRD and Raman spectroscopy. Morphological analysis used AFM and FESEM. Compositional analysis used EDX. Chemical state analysis used XPS. Optical properties were measured using UV-Vis spectroscopy. Electrical properties were measured using Hall effect system. Photoluminescence spectra were recorded with excitation at 300 nm.
5:Data Analysis Methods:
XRD data analyzed using Scherrer formula for crystallite size, lattice constant, and strain. Raman spectra identified vibrational modes. AFM and FESEM images analyzed for surface morphology and roughness. EDX for elemental composition. XPS spectra deconvoluted for binding energies. UV-Vis data used Tauc plot for band gap. Hall measurements for electrical parameters. PL spectra analyzed for emission intensities.
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Atomic force microscope
Dimension edge
Bruker
Study surface morphology
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Field emission scanning electron microscope
Nova Nano SEM 450
FEI
Study surface morphology
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UV-Visible spectrophotometer
V-550
JASCO
Record optical transmittance and absorbance spectra
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X-ray diffractometer
D8 Advance
Bruker AXS
Study the crystalline property of the films
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Micro-Raman spectrometer
Labram HR-800
Horiba Jobin Yvon
Record micro-Raman spectra
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Electron energy dispersive X-ray spectrometer
Quantax 200
EDS
Compositional analysis
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X-ray photoelectron spectrometer
5000 VersaProbe II
PHI
Obtain XPS spectra
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Hall measurement system
HMS 5000
ECOPIA
Determine electrical parameters
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Spectrophotometer
Fluoromax-4
Horiba Jobin Yvon
Record photoluminescence spectra
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In2O3 powder
Sigma Aldrich
Material for sputtering targets
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Au powder
Material for sputtering targets
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Quartz substrate
Substrate for film deposition
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