研究目的
Investigating the effect of deposition temperature and bias voltage on the microstructure, electrical and electrochemical properties, hardness and adhesion strength of diamond-like carbon films deposited using high power impulse magnetron sputtering to address the high electrical resistivity issue for electronic device applications.
研究成果
The research demonstrates that bias voltage and deposition temperature significantly influence the properties of DLC films. Higher bias voltages and temperatures reduce interfacial contact resistance but can compromise corrosion resistance and hardness. The optimal balance for electronic applications is achieved with -400 V bias at 100 °C, considering ICR, corrosion resistance, and hardness. Future studies should explore wider parameter ranges and alternative substrates.
研究不足
The study is limited to specific ranges of bias voltage (0 to -400 V) and deposition temperature (100 °C and 300 °C), and uses only 304 stainless steel and Si substrates. The findings may not generalize to other materials or conditions. Optimization of parameters for broader applications is needed.
1：Experimental Design and Method Selection:
DLC films were synthesized using HiPIMS process with varying bias voltages (0 to -400 V) and deposition temperatures (100 °C and 300 °C) to study their effects on properties. A Ti interlayer was deposited using DCMS.
2：Sample Selection and Data Sources:
Substrates used were Si (100) and 304 stainless steel, cut into
3：5 cm x 5 cm pieces, ultrasonically cleaned. List of Experimental Equipment and Materials:
HiPIMS power source (Zhongxinda HPP12S1, China), graphite target (purity
4：9%), Ti target (purity 99%), argon gas, scanning electron microscopy (SEM), Raman spectroscopy (Horiba Jobin Yvon with 532 nm laser), digital multimeter for ICR measurement, nanoindenter (Agilent G200), scratch tester, electrochemical workstation with three-electrode system (saturated calomel electrode, platinum sheet, 5% NaCl electrolyte). Experimental Procedures and Operational Workflow:
Vacuum chamber evacuated to base pressure, argon flow maintained, substrates cleaned, Ti interlayer deposited, DLC films deposited with specified parameters, followed by characterization using SEM, Raman spectroscopy, ICR tests, hardness tests, adhesion tests, and electrochemical corrosion tests.
5：Data Analysis Methods:
Raman spectra deconvoluted into G and D peaks, ICR calculated from resistance measurements, corrosion parameters extracted from polarization curves, EIS data fitted with equivalent circuit using ZSimpWin software.
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