研究目的
To investigate the effect of substrate temperature during spin coating deposition with halogen lamp heating on the structural and morphological properties of LiNbO3 thin films for optoelectronic applications.
研究成果
The research demonstrates that substrate temperature significantly affects the structural and morphological properties of LiNbO3 thin films, with an optimal temperature around 100°C yielding the best film quality, including reduced grain size and increased surface roughness. The films show promise for optical waveguide applications due to high refractive index. Future studies could focus on broader temperature ranges and other deposition parameters to enhance film properties.
研究不足
The study is limited to a specific range of substrate temperatures (60-120°C) and annealing conditions; higher temperatures above 140°C showed deterioration. The method may not be scalable for industrial applications, and further optimization of parameters like lamp intensity or deposition speed could be explored.
1：Experimental Design and Method Selection:
The study used a modified spin coating method with halogen lamp heating to deposit LiNbO3 thin films on silicon substrates, followed by annealing. The rationale was to control substrate temperature to optimize film quality.
2：Sample Selection and Data Sources:
Raw materials included niobium pentoxide (
3：99% ultra-pure) and lithium carbonate (99% ultra-pure), dissolved in citric acid and ethylene glycol with a
1 molar ratio. Single crystal silicon wafers were used as substrates.
4：List of Experimental Equipment and Materials:
Halogen lamp (220 V, 650 W), spin coater, high-resolution X-ray diffraction system (PANalytical Company, Netherlands), scanning electron microscope (SEM), atomic force microscopy (AFM), optical scanning reflectometer.
5：Experimental Procedures and Operational Workflow:
Precursor solution was prepared by dissolving raw materials in citric acid and ethylene glycol at 90°C with stirring for 48 hours. The solution was spin-coated on silicon wafers at 3000 rpm for 30 seconds. Substrate was heated using halogen lamp to temperatures from 60°C to 120°C. Films were dried at 120°C for 2 minutes and annealed at 500°C for 2 hours in oxygen and air atmosphere. Characterization was done using XRD, SEM, AFM, and optical reflectometry.
6：Data Analysis Methods:
XRD patterns were analyzed to determine crystal structure and lattice parameters using Scherrer's equation for crystallite size. AFM and SEM images were used to analyze morphological properties such as grain size and surface roughness. Optical reflectometry measured film thickness.
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