研究目的
To propose a minimized optical lens head for a dual-beam super-resolution optical data storage system with ultra-high capacities, based on a STED-like process, to overcome limitations of current storage technologies.
研究成果
The customized metasurface successfully minimizes and simplifies the dual-beam optical path, providing a chromatic aberration-free design with high numerical aperture and overlapping beams, making it suitable for future super-resolution optical storage systems with ultra-high capacities.
研究不足
The polarization conversion efficiency is not 100% (84% at 640nm and 25.8% at 780nm), which may affect performance. Fabrication limits of electron beam lithography impose constraints on aspect ratios and pitch sizes.
1：Experimental Design and Method Selection:
The study involves designing and optimizing metasurfaces to generate focused Gaussian and donut beams for wavelengths of 640nm and 780nm, using silicon nano-rod arrays with variable orientations and spatial multiplexing. Theoretical models include Pancharatnam-Berry phase calculations and finite difference time domain simulations.
2：Sample Selection and Data Sources:
A metasurface sample is fabricated on a silica substrate using sputtering and electron beam lithography, with specific nano-rod dimensions and pitch sizes.
3：List of Experimental Equipment and Materials:
Equipment includes a sputtering machine for deposition, electron beam lithography for fabrication, lasers for incident beams (640nm and 780nm wavelengths), a CCD camera, a Leica objective (NA=0.85, 100x), a tube lens, a quarter wavelength wave plate, and a polarizer. Materials include silicon nano-rods and silica substrate.
4：85, 100x), a tube lens, a quarter wavelength wave plate, and a polarizer. Materials include silicon nano-rods and silica substrate. Experimental Procedures and Operational Workflow:
4. Experimental Procedures and Operational Workflow: Incident collimated dual-beams shine on the metasurface; the focused beam is imaged using the objective, tube lens, wave plate, and polarizer to filter out unexpected polarizations. Simulations are conducted using Lumerical solutions software.
5：Data Analysis Methods:
Data analysis involves measuring normalized light intensity distributions, Full Widths at Half Maximums (FWHMs), and numerical aperture (NA) from simulations and optical tests.
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Leica objective
NA=0.85, 100x
Leica
Objective lens used in the optical setup to image the focused beam onto the CCD camera.
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Lumerical solutions
Lumerical
Finite difference time domain simulation software used for numerical simulations of the metasurface.
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sputtering machine
Used to deposit a 300nm thick silicon film on a silica substrate for metasurface fabrication.
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electron beam lithography
Used to fabricate the nano-rod array structure of the metasurface.
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CCD camera
Used to image the focused beam from the metasurface during optical testing.
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tube lens
Lens used in conjunction with the objective lens in the optical imaging setup.
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quarter wavelength wave plate
Used to filter out unexpected circularly polarized beams in the optical testing setup.
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polarizer
Used to filter out unexpected polarizations in the optical testing setup.
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