研究目的
To prepare ultrananocrystalline diamond films with embedded silver nanodroplets to provide antimicrobial properties for implant coatings, addressing the risk of bacterial infections.
研究成果
The study successfully demonstrated that UNCD films with embedded silver nanodroplets exhibit controlled antimicrobial properties, with the capping layer thickness regulating silver release. The samples showed significant antibacterial efficiency against both Gram-negative and Gram-positive bacteria, making them promising for implant coatings to prevent infections.
研究不足
Potential limitations include the influence of knock-on effects during AES sputtering and diffusion during CVD overgrowth on depth profiles, uncertainty in silver deposition thickness, and the need for optimization to balance antibacterial properties with biocompatibility for mammalian cells.
1:Experimental Design and Method Selection:
The study involved preparing UNCD films via microwave plasma-assisted chemical vapor deposition, depositing silver layers, applying rapid thermal annealing for dewetting to form nanodroplets, and capping with a second UNCD layer. Characterization methods included AFM, SEM, AES, and ICP-MS for analysis.
2:Sample Selection and Data Sources:
Silicon substrates were used, with silver layer thicknesses of 3 nm, 5 nm, and 10 nm, and RTA temperatures of 550°C, 650°C, and 750°C. Bacterial assays used Escherichia coli and Bacillus subtilis.
3:List of Experimental Equipment and Materials:
Equipment included MWCVD reactor (ASTeX), electron beam deposition system (PLS 500, Pfeiffer), RTA setup (Xerion), SEM (S-4000, Hitachi Ltd.), AFM (DualscopeTM SPM 95, DME Nanotechnologie GmbH), AES (680 Xi Auger Nanoprobe, PHI), ICP-MS (7500ce, Agilent), and profilometer (XP-100, Ambios Technology). Materials included silicon wafers, silver, methane, nitrogen, deionized water, and bacterial cultures.
4:Experimental Procedures and Operational Workflow:
Steps included substrate preparation, UNCD deposition, silver deposition, RTA treatment, second UNCD deposition, surface characterization, AES depth profiling, silver release testing in water, and bacterial assays with time-kill tests.
5:Data Analysis Methods:
Statistical analysis of nanodroplet size from AFM images using Gwyddion software, AES for composition depth profiles, ICP-MS for silver concentration measurement, and calculation of antibacterial efficiency from colony counts.
独家科研数据包,助您复现前沿成果,加速创新突破
获取完整内容-
Scanning Electron Microscope
S-4000
Hitachi Ltd.
Used for imaging sample morphology in secondary electron mode.
-
Inductively-Coupled Plasma Mass Spectrometer
7500ce
Agilent
Used for detecting silver concentration in aqueous samples.
-
Microwave Plasma-Assisted Chemical Vapor Deposition Reactor
ASTeX
ASTeX
Used for depositing ultrananocrystalline diamond films on silicon substrates.
-
Electron Beam Deposition System
PLS 500
Pfeiffer
Used for depositing thin silver layers on UNCD samples.
-
Rapid Thermal Annealing System
Xerion
Xerion
Used for dewetting silver layers to form nanodroplets.
-
Atomic Force Microscope
DualscopeTM SPM 95
DME Nanotechnologie GmbH
Used for surface topography imaging in tapping mode.
-
Auger Electron Spectrometer
680 Xi Auger Nanoprobe
PHI
Used for composition analysis and depth profiling of samples.
-
Profilometer
XP-100
Ambios Technology
Used for measuring step heights to determine sputter rates.
-
登录查看剩余6件设备及参数对照表
查看全部