研究目的
To investigate the chemical factors related to discharge voltage when (Mg,Ca)O is used as a protective layer for plasma discharge devices, including the effects of exposure environment and an annealing process for recovery.
研究成果
The carbonation of Ca in (Mg,Ca)O protective layers causes increased discharge voltages, which can be mitigated by annealing in vacuum to promote decarbonation. A combined annealing process (air followed by vacuum) is proposed for practical production to achieve low discharge voltages and high luminous efficiencies in plasma discharge devices.
研究不足
The study is limited to specific panel specifications and conditions (e.g., 42-inch panels, 100% Xe content). The XPS analysis may be affected by surface contamination during sample handling. Annealing in vacuum is effective for decarbonation but not for removing organic residues, requiring a combination with air annealing.
1：Experimental Design and Method Selection:
The study used plasma display panels to evaluate dielectric barrier discharge voltage. X-ray photoelectron spectroscopy (XPS) was employed for quantitative analysis of chemical states. Annealing processes in various atmospheres were tested for decarbonation.
2：Sample Selection and Data Sources:
42-inch alternating current plasma display panels with full high definition were produced. MgO and (Mg,Ca)O films were deposited by electron beam evaporation. Samples were exposed to different atmospheres (N2, dry air, normal air) and annealed under various conditions.
3：List of Experimental Equipment and Materials:
XPS system (Ulvac Phi PHI Quantera SXM), electron beam evaporation system, panels with specified dimensions and materials (e.g., ITO electrodes, dielectric layers, protective layers), annealing equipment for vacuum and gas atmospheres.
4：Experimental Procedures and Operational Workflow:
Protective layers were deposited at 350°C with O2 supply. Panels were sealed with N2 gas. XPS measurements were conducted with specific settings (monochromatic Al Kα source, take-off angle 45°, pass energies 69 eV and 140 eV). Annealing was performed at 350°C or 500°C in air, N2, vacuum, N2:H2O, N2:CH4, and N2:CO2 atmospheres.
5：Data Analysis Methods:
XPS spectra were analyzed using Ulvac Phi MultiPak software with Shirley background subtraction. Binding energies were corrected based on C 1s peak at 284.8 eV. Relative sensitivity factors were applied for intensity corrections. Gaussian fitting was used to quantify bonding states and carbonation ratios.
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