1：Experimental Design and Method Selection:

Fabrication of one-dimensional plasmonic PGMA gratings (1DPPGs) using a very-large-scale integration (VLSI) process, including photolithography and atom transfer radical polymerization (ATRP). Immobilization of CQDs on the gratings via covalent bonding. Optical characterization using UV-vis spectroscopy, photoluminescence (PL) emission spectra, and confocal laser scanning microscopy (CLSM). Theoretical modeling of absorptance using the Lorentz-Drude model and grating equations.

2：Sample Selection and Data Sources:

Silicon wafers cut into 1 cm × 1 cm substrates. PGMA gratings with resolutions of 1 μm, 1.5 μm, 2 μm, and 3 μm. CQDs synthesized from cadmium chloride hemi (pentahydrate), sodium sulfide nonahydrate, and cysteamine. Solvents including water, ethanol, toluene, THF, dioxane, and CHCl3 for immersion studies.

3：5 μm, 2 μm, and 3 μm. CQDs synthesized from cadmium chloride hemi (pentahydrate), sodium sulfide nonahydrate, and cysteamine. Solvents including water, ethanol, toluene, THF, dioxane, and CHCl3 for immersion studies. List of Experimental Equipment and Materials:

3. List of Experimental Equipment and Materials: Silicon wafers (Hitachi, Inc.), photoresist, I-line lithography system, atomic force microscope (AFM; Veeco Dimension 5000), transmission electron microscope (TEM; Philips Tecnai G2 F20), UV-vis spectrophotometer (Perkin Elmer Lambda 25), confocal laser scanning microscope (CLSM; Leica TCS SP5), X-ray photoelectron spectrometer (XPS; Scientific Theta Probe), vacuum freeze dryer (BENCHTOP 2K; VIRTIS). Chemicals from Acros Organics and Aldrich Chemicals.

4：Experimental Procedures and Operational Workflow:

(A) Spin-coating photoresist on Si wafer. (B) Patterning trench arrays via I-line lithography. (C) Assembling 3-aminopropyltriethoxysilane (AS) on trench bottoms. (D) Reacting with 2-bromo-2-methylpropionyl bromide (BB) to form initiator. (E) Grafting PGMA brushes via ATRP. (F) Immobilizing CQDs. Characterization steps include XPS, AFM, TEM, UV-vis, PL, and CLSM. Solvent immersion studies to tune grating geometry.

5：Data Analysis Methods:

XPS for chemical composition, AFM for morphology, TEM for particle size, UV-vis for absorptance spectra, PL for fluorescence intensity, CLSM for luminescence distribution. Theoretical analysis using Lorentz-Drude model and grating equations for absorptance prediction.