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Optimal target sputtering mode for aluminum nitride thin film deposition by high power pulsed magnetron sputtering
摘要： Low surface roughness, low residual stress, and (002) textured aluminum nitride (AlN) thin films are favored for applications in microelectronic and optoelectronic devices. In this paper, AlN thin films were deposited by reactive high power pulsed magnetron sputtering (HPPMS). The effect of aluminum target sputtering mode and sputtering power on thin film residual stress, crystalline structure, surface roughness, and morphology of AlN thin films was studied. The results indicate that, with Al target sputtering mode transfer from metallic mode to transitional and compound modes, respectively, the number of Al species decrease, and ion-to-neutral ratio of Al species increase. Comparing the AlN thin film deposited in compound mode with that deposited in transitional mode, the latter exhibited lower surface roughness and residual stress. In addition, AlN thin film with (002) texture and lower residual stress is obtained by increasing sputtering power in transitional mode. For fabricating AlN film via reactive HPPMS with a particular (002) texture, low surface roughness, and residual stress, sputtering the target in the transitional mode with high sputtering power is optimal.
关键词： Aluminum nitride,Microstructure,Texture,High power pulsed magnetron sputtering,Sputtering modes,Sputtering power
更新于2025-09-23 15:23:52
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Diamond like carbon films with embedded Cu nanoclusters deposited by reactive high power impulse magnetron sputtering: Pulse length effects
摘要： In the present study diamond like carbon films with embedded Cu nanoclusters (DLC:Cu films) were deposited by reactive high power impulse magnetron sputtering (HIPIMS). HIPIMS pulse length (pulse on time) effects were considered. The dependence of the chemical composition on pulse length was found. Structure of diamond like carbon matrix of the nanocomposite films studied by Raman scattering spectroscopy has indicated weak increase of the sp3/sp2 carbon bond ratio with HIPIMS pulse length. Studies of the shape and dimensions of copper nanoclusters performed by He ion microscopy have shown that increase of the HIPIMS pulse on time resulted in increased number of the nanoclusters and subsequent increase of the Cu nanoclusters size. Study of optical properties revealed surface plasmon resonance effect in all investigated films. Correlation between the optical absorption spectra and photoexcited charge carrier relaxation time recorded by the pump probe spectroscopy was found. The highest relaxation time was observed at the excitation wavelength close to the absorption surface plasmon resonance peak wavelength The highest maximum relaxation time was observed for the DLC:Cu film deposited by using HIPIMS pulse of 400 μs on time. It was explained by the dependence of the relaxation time on Cu nanocluster size.
关键词： Pulse length,Diamond-like carbon,High-power pulsed magnetron sputtering,Structure,Optical properties,X-ray photoelectron spectroscopy,Copper,Nanoclusters
更新于2025-09-23 15:23:52