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Control of ion-flux and ion-energy in direct inductively coupled plasma reactor for interfacial-mixing plasma-enhanced atomic layer deposition
摘要： The effects of low-energy (<15 eV) high-flux O2+ ion bombardment (>1017 cm?2 cycle?1) during the plasma-enhanced atomic layer deposition (PE-ALD) were investigated. High-dose O2+ ion bombardment on the properties of Al2O3 films deposited on 3D nanostructures by PE-ALD caused interfacial mixing, and AlSiOx films with abrupt interfaces were formed on Si surfaces. Interfacially mixed AlSiOx films were selectively formed on single-crystal Si, amorphous Si, and degraded SiO2 surfaces, whereas normal ALD Al2O3 films were formed on thermally grown SiO2 surfaces. At the same time, the interfacially mixed AlSiOx films were selectively formed on the horizontal top and bottom faces of the 3D nanostructures, whereas normal ALD Al2O3 films were formed on the vertical sidewalls. The morphology and thickness of the film deposited on the amorphous Si surface were the same as those on the single-crystal Si surface. The interfacially mixed AlSiOx film possessed rough surface morphology and a layered structure of Al-/Si-/Al-rich AlSiOx layers. The low-energy high-flux O2+ ion bombardment condition required for the interfacial-mixing ALD was realized in a direct inductively coupled plasma (ICP) reactor with a self-resonant planar coil, in which high-density plasma was excited near the substrate. The O2+ ion flux was found to be controllable over a wide range through variation in the O2 pressure. The ratio of O2+ ion flux at 0.01 Torr to that at 1 Torr was 289. The steep decrease of the ion flux with increasing pressure was attributed to the decrease of electron density in the upstream plasma for intensifying electron energy loss and the decrease of the ambipolar diffusion coefficient in the downstream plasma. A comparison of electron densities near the substrate and those at the presheath edge calculated from measured positive ion fluxes using the Bohm criterion revealed that negative ions, which significantly affect the positive ion flux, scarcely exist near the substrate. The interfacial-mixing PE-ALD has the potential to realize area-selective and topographically selective depositions, which are key technologies for fabricating next-generation electronic devices with 3D nanostructures. The direct ICP reactor is suitable for realizing selective deposition using the interfacial-mixing ALD.
关键词： plasma-enhanced atomic layer deposition,selective deposition,inductively coupled plasma,interfacial mixing,ion bombardment
更新于2025-09-23 15:21:01
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Silicon wafer etching by pulsed high-power inductively coupled Ar/CF <sub/>4</sub> plasma with 150 kHz band frequency
摘要： A silicon wafer etching using a burst pulse high-power inductively coupled plasma (ICP) is investigated. A 200 μs wide burst of a 157 kHz power supply is employed to generate ICP with a repetition rate of 50 Hz. A rectangular pulsed voltage synchronized with the burst power supply is applied upto 1 kV at the wafer. Mixed gas of argon (Ar) and tetrafluoromethane (CF4) is supplied into the vacuum chamber. The plasma density and electron temperature are 1019 m?3 and 2.8 eV where the wafer is, respectively. In the case of Ar plasma, the silicon etching rate is 0.01 μm min?1 with 1000 V negative bias. The etching rate increases to 0.23 μm min?1 by adding CF4 into Ar and increases linearly with increasing the bias voltage. The target current and emission intensity of Ar+ and F* are depended on bias voltage from ?300 to ?1000 V. The etching rate sharply increases by increasing CF4 content from 0% to 10%, and it becomes almost constant at 10%. The dependency of emission intensity of F* on CF4 content is similar to the dependency the etching rate.
关键词： Ar/CF4 plasma,high-power inductively coupled plasma,silicon wafer etching,150 kHz band frequency
更新于2025-09-23 15:21:01
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Comparison of quantitative analyses using SIMS, atom probe tomography, and femtosecond laser ablation inductively coupled plasma mass spectrometry with Si <sub/>1a??X</sub> Ge <sub/>X</sub> and Fe <sub/>1a??X</sub> Ni <sub/>X</sub> binary alloys
摘要： Due to their electrical and physical properties, Si1?XGeX materials are widely used in microelectronic devices. In particular, the Ge component found within Si1?XGeX compounds is important for enhancing carrier mobility and altering the lattice constant of metal-oxide-semiconductor field-effect transistors. In this study, magnetic sector secondary ion mass spectrometry (magnetic sector SIMS) and time-of-flight secondary ion mass spectrometry (ToF-SIMS) were used to determine the accurate concentrations of major compositions present within binary alloy samples. However, quantitative SIMS analysis is limited by the matrix effect, which influences the sputter yield of an element in a compound and alters the secondary ionization yields. Quantitative deviations that were due to the matrix effect were reduced by using Cs cluster ions (MCs+ and MCs2+) instead of elemental ions; the SIMS results using the elements were, therefore, compared with those using MCs+ and MCs2+ cluster ions. In the case of Fe1?XNiX alloys that have a less matrix effect compared to Si1?XGeX alloys, both the Cs primary ion beam (Cs+) and an oxygen primary ion beam (O2+) were used to measure the Fe1?XNiX compositions. The quantitative results from the two different primary ion beams were then compared to understand the ionization process. Deviations in the quantitative values gained with the O2+ beam were lower than those obtained using the Cs+ primary ions, meaning that using oxygen as the primary ion improves the accuracy in quantifying Fe1?XNiX compounds. Other reliable tools for analysis such as atom probe tomography and femtosecond laser ablation inductively coupled plasma mass spectrometry were also used in the quantitative analysis, with results that were consistent with the most accurate results obtained using magnetic sector SIMS and ToF-SIMS.
关键词： Si1?XGeX,femtosecond laser ablation inductively coupled plasma mass spectrometry,atom probe tomography,SIMS,Fe1?XNiX,binary alloys
更新于2025-09-23 15:21:01
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Analysis of Yttria-Stabilized Zirconia by Inductively Coupled Plasma Atomic Emission Spectrometry
摘要： A method for determination of aluminum, hafnium, iron, yttrium, calcium, magnesium, and titanium by inductively coupled plasma atomic emission spectrometry (ICP-AES) is described. Conditions for the decomposition of two modifications of the analyzed material—unburnt and subjected to stabilizing firing—have been studied. It has been found that the unburnt zirconia dissolves in sulfuric acid, and the burnt sample can be converted to solution only by fusing with potassium pyrosulfate or potassium bifluoride. However, the application of these reagents leads to high values of the control experiment correction for trace impurities (at the level of tenths and hundredths of a percent). In this connection, we have studied the possibility of acid dissolution of the burnt sample under microwave decomposition, varying the qualitative and quantitative composition of the acid mixture, reaction temperature, and time to reach and maintain the required temperature. It has been found that the decomposition in the mixture of hydrofluoric and sulfuric acids (2 : 1) in the microwave system with stepwise heating of the reaction mixture ensures quantitative dissolution of the burnt sample and sufficiently low values of the control experiment correction for trace impurities. The analytical lines have been chosen taking into account their relative intensity, possible spectral overlaps, and the matrix effect in the analysis of model solutions containing 1.3 mg/cm3 Zr, 0.2 mg/cm3 Y, and from 0.2 to 20 mg/cm3 impurities. As a result, the following analytical lines have been chosen: Al II 167.079 nm and Al I 308.215 nm, Ca II 184.006 nm and 393.366 nm, Fe II 238.204 nm, Mg II 279.553 nm, Ti II 334.941 nm, Y II 371.030 nm, and Hf II 232.247 nm. The developed method for the analysis of yttria-stabilized zirconia by ICP-AES allows simultaneously determining aluminum, iron, magnesium, and titanium in the range of 0.01–1.0%; calcium, 0.02–1.0%; hafnium, 0.1–5.0%; and yttrium, 2.0–15% with a relative standard deviation of 6–30 rel % (for Al, Fe, Mg, Ti, and Ca), 2–7 rel % (Hg), and 2–4 rel % (Y). The correctness of the method is confirmed by the standard addition technique.
关键词： zirconium dioxide stabilized by yttrium dioxide,inductively coupled plasma atomic emission spectroscopy (ICP-AES),microwave sample preparation
更新于2025-09-23 15:21:01
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Hanging drop cathode-atmospheric pressure glow discharge as a new method of sample introduction for inductively coupled plasma-optical emission spectrometry
摘要： This work reports the use of hanging drop cathode-atmospheric pressure glow discharge (HDC-APGD) as a new method of sample introduction for inductively coupled plasma-optical emission spectrometry (ICP-OES). The developed arrangement was characterized by a low sample uptake (0.56 mL min?1) and the fact that the entire sample solution volume was consumed by the discharge. This resulted in a very high transport efficiency of analytes from the sample solution into the ICP torch (usually > 80%). Under the optimal operating conditions of HDC-APGD, intensities of emission lines of studied elements were, on average, 2 times higher as compared to those obtained with conventional pneumatic nebulization (PN). Moreover, in the case of I and Y, the observed signal enhancements were even higher, i.e., 6.2 and 6.1 times, respectively. It was also shown that in the case of B and some elements that are known to form different volatile species (Ag, Bi, Cd, Hg, Os, Pb, and Se), the presence of low molecular weight organic compounds in the sample solution, i.e., CH3OH, C2H5OH, HCOOH, CH3COOH, or HCHO, resulted in the additional enhancement of their signals. It was especially evident in the case of Hg for which a 8.6-fold signal enhancement in the presence of HCOOH was noticed. The system presented herein was distinguished from other competitive APGD-type discharges because it could be successfully used for the determination of a vast group of elements, including alkali metals, alkaline earth metals, transition metals, and non-metals.
关键词： Atmospheric pressure glow discharge,Hanging drop cathode,Inductively coupled plasma,Optical emission spectrometry,Sample introduction
更新于2025-09-23 15:21:01
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Reactive ion etching of single crystal diamond by inductively coupled plasma: State of the art and catalog of recipes
摘要： Significant technology advances in the growth of single crystal diamond (SCD) have over the past decade led to commercial offerings of high quality SCD substrates, typically available in the form of well specified plates of several square millimeters in size [1]. At the same time, the cost of such plates has considerably decreased [2], which has triggered important research and development efforts aiming to exploit the exceptional optical [3], thermal [4] and mechanical properties [5] of SCD for a variety of applications in electronics [6], photonics [7–10], optics and opto-mechanics [11] and quantum technologies [12].
关键词： Single Crystal Diamond,State of the Art,Reactive Ion Etching,Catalog of Recipes,Inductively Coupled Plasma
更新于2025-09-23 15:21:01
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Analysis of High-Purity Germanium Dioxide by Inductively Coupled Plasma Atomic Emission Spectrometry with Reaction Distillation of the Matrix
摘要： A combined method of analysis of high-purity germanium dioxide by atomic emission spectrometry with matrix preseparation and trace element preconcentration was developed. The matrix was separated in an autoclave of a MARS 5 microwave system without the contact of samples with an acid solution. The method allows the determination of the following 50 analytes with the limits of detection 10–8–10–5 wt %: Ag, Al, As, Au, B, Ba, Be, Cd, Ce, Co, Cr, Cu, Dy, Er, Eu, Fe, Ga, Gd, Hf, Hg, Ho, In, La, Li, Lu, Mg, Mn, Na, Nb, Nd, Ni, P, Pb, Pr, Re, Sb, Sc, Sm, Sn, Sr, Ta, Tb, Te, Ti, Tm, W, Y, Yb, Zn, and Zr.
关键词： high-purity germanium dioxide,matrix separation,limits of detection,atomic emission spectrometry,inductively coupled plasma,multielement analysis
更新于2025-09-23 15:21:01
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Applicability of a field portable X-ray fluorescence for analyzing elemental concentration of waste samples
摘要： Determining the chemical properties of waste is crucial to ensure the most effective utilization of waste. The standard laboratory measurements can produce accurate results, but analysis is labor- and time-consuming. The variety of elements that field portable X-ray fluorescence spectrometry (FPXRF) can detect from selected waste materials was studied, including how the results compared with those of inductively coupled plasma mass spectrometry (ICP-MS) measurements. The selected materials were fine fraction reject from solid recovered fuel production, fly ash, biowaste, and compost. Based on the results, FPXRF is reported to be best suited for waste samples, such as ash and compost, because of their physical properties, as follows: not too moist, quite small particle size, and not too heterogeneous. The results obtained from FPXRF showed the lowest relative standard deviation for ash material. The analysis of the limits of agreement between FPXRF and ICP-MS showed that FPXRF was mainly suitable for qualitative assessment. Furthermore, regression analysis showed a linear correlation between FPXRF and ICP-MS results for calcium and zinc in the selected materials. Keeping the limitations in mind, FPXRF could be used for qualitative analysis in waste treatment processes, such as first quality control of waste materials.
关键词： Inductively coupled plasma mass spectrometry,Waste,Field portable X-ray fluorescence spectrometry,Elemental analysis
更新于2025-09-23 15:21:01
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Temporal evolution of spatial optical emission characteristics by inductively-coupled impulse sputtering (ICIS) using high power-burst 155kHz-ICP
摘要： A copper target was negatively-biased and was sputtered by bombardment of argon ion species produced 155 kHz-inductively-coupled plasma (ICP) in a burst-pulse mode for a duration of 800 μs. This system was called ICIS (Inductively-coupled impulse sputtering). The plasma density was on the order of 1019 m-3 in the ICP region. The target current density and the power density were about 0.8 A/cm2 and about 0.3 kW/cm2, respectively. Temporal evolution of the optical emission of the plasma species was discussed. The observed species were argon ions, excited argon and excited copper. The entire region consisted of the ICP, a bulk plasma and a target plasma. Argon ions produced in the ICP were transported by an ambipolar diffusion toward the target and excited argon and excited copper species were mainly produced in the target plasma. A plateau emission by argon ions and spike emission by energetic electrons which were originated from secondary electrons were seen. Gas rarefaction of argon gas also influenced the temporary evolution particularly near at the target. This was discussed using a carbon target.
关键词： Inductively-coupled impulse sputtering,glow discharge,Inductively-coupled plasma,High power impulse magnetron sputtering,HiPIMS,ICIS
更新于2025-09-23 15:19:57
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Spectral analysis of Miracle Moringa tree leaves using X-ray photoelectron, laser induced breakdown and inductively coupled plasma -optical emission spectroscopic techniques
摘要： The antioxidant Moringa oleifera (a medicinal plant) leaves (MOLs) containing diverse nutrients are highly beneficial for the human health. The MOLs upon consumption can lower the blood sugar, cure the heart diseases, and reduce the inflammation. In this perception, the “primary nutrients contents” in the dry MOLs (pellet samples) were evaluated for the first time using the XPS, LIBS and ICP-OES techniques. The XPS analysis of the MOLs showed the presence of vital elements like calcium (Ca), magnesium (Mg), manganese (Mn), copper (Cu), phosphorous (P), sulfur (S) and zinc (Zn). The LIBS analyses of the MOLs revealed the atomic and ionic spectral lines corresponding to the essential nutrients such as the Ca, Na, K, Fe, Mg, Mn, Cu, P, S and Zn. The calibration free LIBS algorithm (CF-LIBSA) was developed to quantify the content of each element in the dry MOLs. In addition, the LIBS results were validated by the analysis using ICP-OES standard analytical technique. The elemental contents in the MOLs obtained from the CF-LIBS analyses were counter verified by the ICP-OES results. Present results are highly valuable for the development of a traditional herbal medicine using the miracle MOLs.
关键词： Calibration free LIBS algorithm,Laser induced breakdown spectroscopy,Moringa oleifera leaves,X-ray photoelectron spectroscopy,Inductively coupled plasma atomic emission spectroscopy
更新于2025-09-23 15:19:57