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Effects of post bonding annealing on GaAs//Si bonding interfaces and its application for sacrificial-layer-etching based multijunction solar cells
摘要： By using the sacrificial layer (SL) etching, GaAs substrates are separated from III–V epi substrate//Si substrate junctions that are made by surface activated bonding (SAB) technologies. The post-bonding low-temperature (300-?C) annealing plays an essential role in achieving a promising (～90%) bonding yield. The effects of the post-bonding annealing are investigated by hard X-ray photoemission spectroscopy and current–voltage measurements of GaAs//Si bonding interfaces. It is found that the concentration of oxygen atoms at interfaces is reduced and the resistance decreases to 1.6–2.1 m??cm2 by the low-temperature annealing. Aluminum fluoride complexes are not observed by X-ray photoelectron spectroscopy on the exposed surfaces of separated GaAs substrates. The roughness average of the surfaces is ≈0.25–0.30 nm. The characteristics of double junction cells fabricated on the GaAs//Si junctions prepared by the SL etching are almost the same as those of cells fabricated by dissolving GaAs substrates after bonding. These results indicate that multijunction cells could be fabricated in a process sequence compatible with reuse of GaAs substrates by combining the SL etching and SAB.
关键词： Sacrificial layer etching,GaAs//Si double junction cells,Surface activated bonding,Low temperature annealing,Epitaxial lift-off
更新于2025-09-23 15:19:57
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Influence of baking temperature on relevant properties of sol-gel Ga-doped ZnO thin films annealed at low temperature
摘要： Ga-doped ZnO(GZO) transparent thin films were grown onto glass substrates by sol-gel based spin coating process. After each coating, the as-deposited film was thermally baked at different moderate temperatures ranging from 100°C to 250°C followed by calcinations at certain temperature lower than 400°C. Characterization were conducted on calcined samples using scanning electron microscope (SEM), X-ray diffraction (XRD), optical spectroscopy and Fourier transform infrared spectroscopy (FTIR). The influence of baking temperature on crucial properties including structural, morphological and optical properties of Ga-doped ZnO transparent thin films were extensively investigated. XRD patterns exhibited typical polycrystalline of hexagonal wurtzite structure of as-deposited thin films and baking temperature is considered as one of essential key parameters affecting the crucial properties of the prepared films.
关键词： Low temperature annealing,Ga-doped ZnO,Baking temperature,Spin coating
更新于2025-09-12 10:27:22
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AIP Conference Proceedings [AIP Publishing 15th International Conference on Concentrator Photovoltaic Systems (CPV-15) - Fes, Morocco (25–27 March 2019)] 15th International Conference on Concentrator Photovoltaic Systems (CPV-15) - Low-temperature silicon surface passivation for bulk lifetime studies based on Corona-charged Al2O3
摘要： Bulk lifetime studies of crystalline silicon wafers, e.g. with the aim of studying the light-induced degradation and regeneration behavior, require low-temperature surface passivation schemes that do not alter the silicon bulk properties, e.g. through hydrogenation. Aluminum oxide (Al2O3) can provide an excellent and stable surface passivation, however, in order to achieve the best possible surface passivation, an annealing step at ~400°C is typically required, which has been found to alter the bulk properties of some silicon materials. Hence, in this contribution we examine the possibility of passivating the silicon surface using Al2O3 layers that have seen a much lower thermal budget. We demonstrate that we are able to achieve an excellent silicon surface passivation using atomic-layer-deposited Al2O3 with measured effective surface recombination velocities Seff as low as 1.3 cm/s without exceeding a temperature of 250°C. We are able to achieve such excellent low-temperature passivation by applying a post-deposition annealing step at 250°C in combination with the deposition of negative Corona charges on the Al2O3 surface. For samples annealed at only 220°C, we still reach very low Seff values of 2 cm/s after deposition of negative Corona charges. We demonstrate that the Corona-charged low-temperature Al2O3 passivation shows only a slight degradation from an Seff of 1.6 cm/s to an Seff of 5 cm/s after 218 days of storage. Even without any post-deposition anneal and only negative Corona charges deposited, we achieve stable Seff values of 15 cm/s. As an alternative to Corona charging, a short exposure to intense UV light (λ = 395 nm) also significantly improves the surface passivation quality of low-temperature-annealed Al2O3-passivated silicon samples. However, the best surface passivation for the latter method is limited to an Seff value of 6.6 cm/s, which is still quite reasonable for bulk lifetime studies.
关键词： bulk lifetime studies,Al2O3,Corona charging,silicon surface passivation,low-temperature annealing
更新于2025-09-11 14:15:04