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Preparation of humidity, abrasion, and dust resistant antireflection coatings for photovoltaic modules via dual precursor modification and hybridization of hollow silica nanospheres
摘要： Antire?ection (AR) coatings on solar glass, used in photovoltaic (PV) modules, generally encounter harsh environments, which demands that AR coatings must hinder moisture penetration, scratch damage, and dust accumulation. Though chemical modi?cation generally bene?ts the multi-functionalization of AR coatings, it is likely to bring about a degradation of optical and mechanical properties. We demonstrated that a well-controlled dual precursor modi?cation/hybridization process of hollow silica nanospheres was the key to achieve the robust multifunctional AR coatings. The dual precursor-derived AR coatings exhibited an increase of 5.08% in average transmittance at wavelengths from 300 to 1200 nm and a small relative reduction below 0.6% after an ultra-long highly-accelerated humidity and temperature stress test duration of 120 h, equivalent to a 5000 h damp heat test at a temperature and a relative humidity of 85 °C and 85%, respectively, as well as the excellent abrasion and dust resistance. The e?ects of the dual precursor-derived AR coatings on PV devices were evaluated by the encapsulated crystalline silicon mini-modules, where the improvements of 2.45% and 3.20% in the short-circuit current and the power conversion e?ciency (Jsc and PCE) on average, respectively, relative to the bare glass encapsulated mini-modules were observed; meanwhile, the dust resistance of the AR coatings brought about the less degradations of 1.01% and 1.15% in Jsc and PCE, respectively, after the dust settling and removal tests, while the mini-modules with bare glass were 3.45% and 4.40%. It was believed that the dual-precursor, potentially, multi-precursor protocols would pave the way towards developing mechanically robust AR coatings with various fascinating functionalities, such as anti-?ngerprint, anti-soiling, anti-fogging, and anti-icing.
关键词： Dual precursors,Hollow silica nanospheres,Antire?ection coatings,Dust resistance,Abrasion,Humidity
更新于2025-09-23 15:23:52
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Controlled etching of silica nanospheres monolayer for template application: A systematic study
摘要： Monolayers of silica nanospheres (SNs), via self- or guided-assembly has been extensively used for template fabrication in thin films, employed in the areas of plasmonics, photonic crystals, and solar cells. We report on a versatile, rapid, and controllable process to obtain non-close-packed structure by restructuring the SNs geometry at two-particle level. A geometrical model has been proposed to quantify parameters that control the final morphology of the monolayer. SNs of different sizes (viz. 140 nm, 170 nm, and 220 nm) were self-assembled as a close-packed monolayer on a silicon substrate using a three-step spin coating method and then sintered at 950oC before being exposed to an etchant. We investigate the dependence of particle radius, neck (formed due to sintering) parameters and distance between the SNs, on etching time and etchant concentration. The intermediate and final morphology of the restructured monolayer is used as a template to grow silicon nanowires using metal-assisted chemical etching. We provide quantitative estimates of the parameters pertaining to the restructuring of the monolayer of SNs, which can be used as tunable templates for the growth of nanowires. The optimized process can be scaled-up for industrial application because of its faster and controllable rate of production.
关键词： Silica Nanospheres,Sintering,Etching,Non-Close-Packed Monolayer,Self-Assembly
更新于2025-09-12 10:27:22
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Systematic Investigation of Close-Packed Silica Nanospheres Monolayer under Sintering Conditions
摘要： In this paper, we have quantified and investigated the effect of various sintering temperature on close-packed Silica Nanospheres (SNs) monolayers. SNs with diameters of 140, 175 and 220 nm were fabricated by an effective and reliable spin-coating technique. The fabricated SNs monolayers were sintered up to 1200°C and were analyzed from FESEM to investigate in details for local and extended transformations in their structural and morphological properties. A distinct "neck-formation" was observed and was quantified with different particle size distribution as well as surface packing density. It was observed that SNs monolayer undergoes intra-particle reformation in the form of shrinkage in individual SNs and compactification of growth domains, followed by inter-particle sintering. A geometrical model was developed to determine the curvature radius and interpenetration depth thus enabling us to quantify the parameters that dominate the dynamics of the sintering process for such non-porous SNs.
关键词： Scanning Electron Microscopy,Geometrical Model,Silica Nanospheres,Sintering
更新于2025-09-10 09:29:36