Oxygen partial pressure dependent UV photodetector performance of WO3 sputtered thin films

摘要： The influence of oxygen partial pressure (pO2) on the ultra-violet (UV) photodetector performance of WO3 thin films was studied. Here, the thickness of the WO3 thin films decreased from 225 nm to 150 nm with increasing the pO2 from 5% to 20%. The crystallinity of WO3 films decreased at higher pO2. The XPS analysis confirmed that the WO3 film deposited at 10% of pO2 had the more oxygen vacancies. The grain size of WO3 films decreased at higher pO2 grown conditions owing to the fragmentation of the oxide formation through the plasma. From current-voltage (I-V) measurements of WO3/Ti device, the ohmic-contact implies the formation of the metal-semiconductor junction with very less barrier height (?B) and it helps to the trapping of generated electrons for potential photodetector. Due to the higher number of incoming photons, the photocurrent was found to be increased as the power density increases. Finally, the WO3 film deposited at 10% of pO2 exhibits the higher photocurrent and quick rising time and hence this optimized thin film is suitable for UV-A photodetector.