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Simple Fabrication of Pillar Silicon Nanostructures by a Contact Block Copolymer Technique
摘要： In this study, silicon nanopillar structures were fabricated by a contact block copolymer (BCP) technique, which is a potential technique for the fabrication of self-aligned silicon nanoscale structures. For the contact BCP technique, a nanometer-scale BCP hole pattern was formed on the silicon surface and the silicon, masked with BCP, was exposed to a nitrogen ion beam for surface nitriding. Using the nitride surface as the etch mask, after the removal of the BCP silicon nanopillar structures could be successfully fabricated using a low-energy chlorine-based ion beam. By eliminating the additional steps of hard mask deposition and etching, this technique provided a simplified method of forming a silicon nanostructure. Especially, due to the extremely low thickness of the nitride mask layer, precise transfer of the mask dimension to the silicon was possible. The use of a low-energy ion beam could not only minimize the damage to the nanopillar silicon surface but could also increase the etch selectivity.
关键词： Block Copolymer,Inverted Ion Beam Etching,Pillar-Type Silicon Nanostructure,Surface Nitriding
更新于2025-09-09 09:28:46
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Viscoelastic change of block copolymer ion gels in a photo-switchable azobenzene ionic liquid triggered by light
摘要： A photo-switchable ionic liquid solvent bearing an azobenzene moiety induced a viscoelastic change of block copolymer ion gels by light. ABA triblock copolymers having poly(phenethyl methacrylate) and poly(benzyl methacrylate) as A blocks exhibited opposite photo-induced rheological responses although they had only a tiny structural difference in the alkyl chain length.
关键词： block copolymer,ion gels,light,viscoelastic change,ionic liquid,azobenzene,photo-switchable
更新于2025-09-04 15:30:14