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Attosecond Pulse Shaping by Multilayer Mirrors
摘要： The emerging research field of attosecond science allows for the temporal investigation of one of the fastest dynamics in nature: electron dynamics in matter. These dynamics are responsible for chemical and biological processes, and the ability to understand and control them opens a new door of fundamental science, with the possibility to influence all lives if medical issues can thereby be addressed. Multilayer optics are key elements in attosecond experiments; they are used to tailor attosecond pulses with well-defined characteristics to facilitate detailed and accurate insight into processes, e.g., photoemission, Auger decay, or (core-) excitons. Based on the investigations and research efforts from the past several years, multilayer mirrors today are routinely used optical elements in attosecond beamlines. As a consequence, the generation of ultrashort pulses, combined with their dispersion control, has proceeded from the femtosecond range in the visible/infrared spectra to the attosecond range, covering the extreme ultraviolet and soft X-ray photon range up to the water window. This article reviews our work on multilayer optics over the past several years, as well as the impact from other research groups, to reflect on the scientific background of their nowadays routine use in attosecond physics.
关键词： attosecond,X-ray,extreme ultraviolet (EUV),soft X-ray,multilayer,mirror
更新于2025-09-23 15:23:52
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Angular dispersion enhanced prebunch for seeding ultrashort and coherent EUV and soft X-ray free-electron laser in storage rings
摘要： Prebunching is an effective technique to reduce the radiation saturation length and to improve the longitudinal coherence and output stability in storage-ring-based free-electron lasers (FELs). A novel technique is proposed which uses angular dispersion to enhance the high-harmonic bunching with very small laser-induced energy spread. This technique can effectively reduce the radiation saturation length without significantly reducing the peak power of the FEL. Numerical simulations demonstrate that this technique can be used for the femtosecond generation of 100 MW scale level, fully temporal coherent extreme-ultraviolet and soft X-ray radiation pulses through a 10 m-long undulator based on a diffraction-limited storage ring.
关键词： angular dispersion,free-electron lasers,prebunching,storage rings,high-harmonic bunching,radiation saturation length,ultrashort,extreme-ultraviolet (EUV)
更新于2025-09-23 15:21:01
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Characteristics of laser induced discharge tin plasma and its extreme ultraviolet radiation
摘要： In this paper, a CO2 laser induced discharge plasma extreme ultraviolet (EUV) source experimental device was established. The optical emission spectroscopy was used to diagnose the characteristics of the plasma, and the evolution of electron temperature and electron density with time was obtained. The in?uence of discharge voltage on plasma parameters was analyzed and discussed. The EUV radiation characteristics of the plasma were investigated by self-made grazing incidence EUV spectrometer. The EUV radiation intensity and conversion ef?ciency were discussed.
关键词： laser induced discharge plasma,extreme ultraviolet (EUV) radiation,electron temperature and density,optical emission spectroscopy
更新于2025-09-23 15:19:57
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Radiation transport and scaling of optical depth in Nd:YAG laser-produced microdroplet-tin plasma
摘要： Experimental scaling relations of the optical depth are presented for the emission spectra of a tin-droplet-based, 1-lm-laser-produced plasma source of extreme-ultraviolet (EUV) light. The observed changes in the complex spectral emission of the plasma over a wide range of droplet diameters (16–65 lm) and laser pulse durations (5–25 ns) are accurately captured in a scaling relation featuring the optical depth of the plasma as a single, pertinent parameter. The scans were performed at a constant laser intensity of 1.4 (cid:2) 1011 W/cm2, which maximizes the emission in a 2% bandwidth around 13.5 nm relative to the total spectral energy, the bandwidth relevant for industrial EUV lithography. Using a one-dimensional radiation transport model, the relative optical depth of the plasma is found to linearly increase with the droplet size with a slope that increases with the laser pulse duration. For small droplets and short laser pulses, the fraction of light emitted in the 2% bandwidth around 13.5 nm relative to the total spectral energy is shown to reach high values of more than 14%, which may enable conversion ef?ciencies of Nd:YAG laser light into—industrially—useful EUV radiation rivaling those of current state-of-the-art CO2-laser-driven sources.
关键词： microdroplet-tin plasma,Nd:YAG laser,optical depth,radiation transport,extreme-ultraviolet (EUV) light
更新于2025-09-12 10:27:22
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Reference Module in Materials Science and Materials Engineering || Optical Lithography
摘要： Optical lithography is a photon-based technique comprised of projecting, or shadow casting, an image into a photosensitive emulsion (photoresist) coated onto the substrate of choice. Today it is the most widely used lithography process in the manufacturing of nano-electronics by the semiconductor industry, a $400 Billion industry worldwide. Optical lithography’s ubiquitous use is a direct result of its highly parallel nature allowing vast amounts of information (i.e., patterns) to be transferred in a very short time. For example, considering the specification of a modern leading edge scanner (150–300-mm wafers per hour and 40-nm two-dimensional pattern resolution), the pixel throughput can be found to be approximately 1.8T pixels per second. Continual advances in optical lithography capabilities have enabled the computing revolution we have undergone over the past 50 years.
关键词： Nano-electronics,Numerical Aperture (NA),Coherence,Resolution,Photoresist,Depth of Focus (DOF),Optical Lithography,Extreme Ultraviolet (EUV),Semiconductor
更新于2025-09-10 09:29:36