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oe1(光电查) - 科学论文

138 条数据
?? 中文(中国)
  • FFT analysis of surface structures fabricated by laser interference lithography

    摘要: This paper presents an FFT (fast Fourier transform) analytical method for the study of surface structures fabricated by laser interference lithography (LIL). In the work, the FFT analytical method combined with Gaussian fitting is used to determine the periods and pattern distributions of surface structures from frequency spectra. For LIL, the processing parameters of incident and azimuth angles can be obtained corresponding to the period and pattern distribution. This work facilitates the detection of micro- and nano-structures, the analysis of pattern distribution in engineering, and the processing error analysis of LIL.

    关键词: surface structures,micro- and nano-structures,pattern distribution,laser interference lithography,FFT analysis

    更新于2025-11-25 10:30:42

  • Light management in crystalline silicon thin-film solar cells with imprint-textured glass superstrate

    摘要: The implementation of light management textures in thin-film solar cells often simultaneously causes an undesired deterioration of electronic performance. Here, we introduce a simple yet effective technique for improved light management in liquid phase crystallized silicon thin-film solar cells on glass. By imprinting pyramidal textures on the sun-facing side of the glass superstrate, absorber and functional layers of the device remain unaffected while light in-coupling is significantly increased. An increase of short-circuit current density by 2.5 mA cm2 was observed by texturing the glass in this way, corresponding to an enhanced power conversion efficiency from 12.9% to 13.8%. Optical simulations allow to attribute the increase in equal shares to an anti-reflective effect at the air-glass interface as well as light scattering and multiple passes through the glass. The technology allows for independent optimization of optical performance without compromising on electronic material issues and is therefore useable for any other solar cell technology using a glass superstrate.

    关键词: Light management,Nano-imprint lithography,Liquid phase crystallization,Thin-film solar cells,Silicon

    更新于2025-10-22 19:40:53

  • Fabrication of Large Area Sub-200 nm Conducting Electrode Arrays by Self-Confinement of Spincoated Metal Nanoparticle Inks

    摘要: Here, the fabrication of sub-200 nm metal wires from commercial silver inks with 50 nm particle size, 100 times narrower than with typical low-resolution ink-jet and screen printing in flexible electronics, is demonstrated. Using a combination of spincoating on prepatterned polymer substrates and flash lamp annealing, nanoparticles merge to wires featuring good electrical conductivity. With this method less than 150 nm thin wires can be generated from 2 μm wide or smaller V-grooves due to adapted dilution of particle content, self-confinement in V-grooves, shrinkage of line width during solvent evaporation, and sintering. After nanoimprinting, grooves made from PMMA are smoothened out by thermal reflow without affecting the wires. The resistivity of 300 μm long, 400 nm wires is similar to more conventional ink-jet printed wires with 10–50 μm widths.

    关键词: self-confinement,V-groove,flash lamp annealing,nanoimprint lithography,silver nanoparticles

    更新于2025-09-23 15:23:52

  • Elucidating the Exceptional Passivation Effect of 0.8 nm Evaporated Aluminium on Transparent Copper Films

    摘要: Slab-like copper films with a thickness of 9 nm (~70 atoms) and sheet resistance of ≤9 Ω sq?1 are shown to exhibit remarkable long-term stability toward air-oxidation when passivated with an 0.8 nm aluminium layer deposited by simple thermal evaporation. The sheet resistance of 9 nm Cu films passivated in this way, and lithographically patterned with a dense array of ~6 million apertures per cm2, increases by <3.5% after 7,000 h exposure to ambient air. Using a combination of annular-dark field scanning transmission electron microscopy, nanoscale spatially resolved elemental analysis and atomic force microscopy, we show that this surprising effectiveness of this layer results from spontaneous segregation of the aluminium to grain boundaries in the copper film where it forms a ternary oxide plug at those sites in the metal film most vulnerable to oxidation. Crucially, the heterogeneous distribution of this passivating oxide layer combined with its very low thickness ensures that the underlying metal is not electrically isolated, and so this simple passivation step renders Cu films stable enough to compete with Ag as the base metal for transparent electrode applications in emerging optoelectronic devices.

    关键词: passivation,thin film,transparent electrode,lithography,copper

    更新于2025-09-23 15:23:52

  • Preparation and measurement of subwavelength bilayer metal wire grid polarizers on flexible plastic substrates

    摘要: This paper presents a process for the fabrication of subwavelength bilayer metal wire grid polarizers and describes the performance characterization of polarizers that were produced using the proposed method. These polarizers have a period of 278 nm and were fabricated on flexible plastic substrates using nanoimprint lithography followed by an aluminum deposition process. Transmission efficiency in excess of 0.55 and an extinction ratio of more than 32 dB were achieved in the visible range when the aluminum layer thickness of the polarizer was 70 nm. When a polarization analyzer with a six-channel sensor prototype was tested, an average error of 0.2002? was obtained, with a maximum error of 1.105? and a standard deviation of 0.7255?. The proposed fabrication method will be suitable for many applications in optics, including the manufacture of compound eye structures.

    关键词: Extinction ratio,TM transmission,Nanoimprint lithography,Bilayer metal wire-grid polarizers

    更新于2025-09-23 15:23:52

  • Microfluidics Integrated Lithography-Free Nanophotonic Biosensor for the Detection of Small Molecules

    摘要: Currently, labeling techniques are mostly used to study the binding kinetics of small molecules and their detection (molecular weights <500 Daltons) at low analyte concentrations. However, the fluorescent tags used in this method for conjugation may modify or prevent the functionality of the targeted molecules. Although label-free techniques provide more accurate quantitative and kinetic measurements by monitoring the binding of analytes in their usual forms, the monitoring of small molecule binding at lower concentrations is still impossible using conventional refractometric sensing devices. Here, a label-free and cost-effective technique is demonstrated for the detection of ultralow molecular weight biomolecules such as biotin (244 Daltons) at very low concentrations. This extreme sensitivity is realized by utilizing the phase singularity feature of lithography-free nanophotonic cavities. The proposed four-layered metal-dielectric-dielectric-metal asymmetric Fabry–Perot cavity exhibits point-of-darkness and phase singularity at the Brewster angle. Since the singular phase behavior depends on the topology of the cavity surface, it is very challenging to realize singular phase in reflection mode for a microfluidics integrated nanophotonic cavity. To overcome this issue, a specially designed polymethylmethacrylate microfluidic channel is integrated with the cavity.

    关键词: flat-optics,small biomolecules,Fabry–Perot cavities,lithography-free,label-free optical biosensors,biosensors

    更新于2025-09-23 15:23:52

  • Nanofluidic and monolithic environmental cells for cryogenic microscopy

    摘要: We present a device capable of combining nanofluidics and cryogenic transmission electron microscopy (cryo-TEM) to allow inspection of water-soluble samples under near-native conditions. The devices can be produced in a multitude of designs, but as a general rule, they consist of channels or chambers enclosed between two electron-transparent silicon nitride windows. With the appropriate design, those devices can allow screening of multiple samples in parallel and remove the interaction between the sample and the environment (no air–water interface). We demonstrate channel sizes from 80 to 500 nm in height and widths from 100 to 2000 μm. The presented fabrication flow allows producing hollow devices on a single wafer eliminating the need of aligning or bonding two half-cavities from separate wafers, which provides additional resistance to thermal stress. Taking advantage of a single-step through-membrane exposure with a 100 keV electron beam, we introduced arrays of thin (10–15 nm) electron-transparent silicon nitride membrane windows aligned between top and bottom (200–250 nm) carrier membranes. Importantly, the final devices are compatible with standard TEM holders. Furthermore, they are compatible with rapid freezing of samples, which is crucial for the formation of vitreous water, hence avoiding the formation of crystalline ice, that is detrimental for TEM imaging. To demonstrate the potential of this technology, we tested those devices in imaging experiments verifying their applicability for cryo-TEM applications and proved that vitreous water could be prepared through conventional plunge freezing of the chips.

    关键词: nanofabrication,TEM,environmental chamber,microfluidic cell,electron beam lithography,cryo-TEM

    更新于2025-09-23 15:23:52

  • High-performance flexible transparent nanomesh electrodes

    摘要: A cost-effective process for producing high-performance Ag-paste-based flexible transparent nanomesh electrodes was developed by optimizing their linewidth, pitch, and height. These nanomesh electrodes, with a linewidth of several hundred nanometers and a pitch of 10–200 μm on a PET substrate, achieved wide ranges of transmittance (83.1–98.8%) and sheet resistance (1.2–30.9 Ω/sq) and a figure of merit (992–1619) superior to those of indium tin oxide (ITO) and silver nanowire (AgNW) electrodes. Our evaluation of their flexibility (testing up to 50,000 cycles) and their electromagnetic interference shielding effectiveness verifies the applicability of these flexible transparent nanomesh electrodes to various flexible optoelectronic devices.

    关键词: nanomesh,optoelectronic properties,flexible transparent conducting electrodes,Ag paste,phase-shifting edge lithography

    更新于2025-09-23 15:23:52

  • Resonance reflection of light by ordered silicon nanopillar arrays with the vertical p-n junction

    摘要: Silicon nanopillar (Si NP) arrays with the axial p-n junction were formed and investigated. A method to fabricate Si NP ordered arrays by means of electron beam lithography using the negative electron resist and reactive ion etching is presented. The effect of strong resonance light scattering – change of the color of separate Si NPs - was demonstrated. One or several minima were registered in the measured reflection spectra. Thereat, the position of reflection minimum was changed with a change in Si NP diameter. A shift of the minimum position towards the longer wavelength spectral region with an increase in Si NP diameter was observed. A shift of the position of minima to the shorter wavelength spectral region with a decrease in Si NP pitch in microarrays with the same Si NP diameter was observed. The quantitative divergence in the position of reflection minima in Si NPs with calculated dependencies for Mie resonances was found. High photosensitivity of Si NP arrays with axial p-n junction to visible and near IR light was discovered. So, these structures may be used for selective photonic sensors.

    关键词: reflectance spectra,silicon nanopillars,electrophysical properties,reactive ion etching,electron beam lithography

    更新于2025-09-23 15:23:52

  • The Monte Carlo Simulation of Secondary Electrons Excitation in the Resist PMMA

    摘要: The Monte Carlo method was used to simulate the process of secondary electrons excitation in resist PMMA with Mott cross section and dielectric function model. By analyzing the characteristics of secondary electrons excitation in the resist PMMA, and the simulation of secondary electrons energy range, we hold the opinion that the secondary electrons can not be ignored in the electron beam lithography.

    关键词: Monte Carlo simulation,electron beam lithography (EBL),dielectric function,secondary electrons

    更新于2025-09-23 15:23:52