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- 实验方案
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Fabrication of Large Area Sub-200 nm Conducting Electrode Arrays by Self-Confinement of Spincoated Metal Nanoparticle Inks
摘要： Here, the fabrication of sub-200 nm metal wires from commercial silver inks with 50 nm particle size, 100 times narrower than with typical low-resolution ink-jet and screen printing in flexible electronics, is demonstrated. Using a combination of spincoating on prepatterned polymer substrates and flash lamp annealing, nanoparticles merge to wires featuring good electrical conductivity. With this method less than 150 nm thin wires can be generated from 2 μm wide or smaller V-grooves due to adapted dilution of particle content, self-confinement in V-grooves, shrinkage of line width during solvent evaporation, and sintering. After nanoimprinting, grooves made from PMMA are smoothened out by thermal reflow without affecting the wires. The resistivity of 300 μm long, 400 nm wires is similar to more conventional ink-jet printed wires with 10–50 μm widths.
关键词： self-confinement,V-groove,flash lamp annealing,nanoimprint lithography,silver nanoparticles
更新于2025-09-23 15:23:52
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Preparation and measurement of subwavelength bilayer metal wire grid polarizers on flexible plastic substrates
摘要： This paper presents a process for the fabrication of subwavelength bilayer metal wire grid polarizers and describes the performance characterization of polarizers that were produced using the proposed method. These polarizers have a period of 278 nm and were fabricated on flexible plastic substrates using nanoimprint lithography followed by an aluminum deposition process. Transmission efficiency in excess of 0.55 and an extinction ratio of more than 32 dB were achieved in the visible range when the aluminum layer thickness of the polarizer was 70 nm. When a polarization analyzer with a six-channel sensor prototype was tested, an average error of 0.2002? was obtained, with a maximum error of 1.105? and a standard deviation of 0.7255?. The proposed fabrication method will be suitable for many applications in optics, including the manufacture of compound eye structures.
关键词： Extinction ratio,TM transmission,Nanoimprint lithography,Bilayer metal wire-grid polarizers
更新于2025-09-23 15:23:52
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Long-term analysis of PV module with large-area patterned anti-reflective film
摘要： Due to the PV modules are exposed to the external environment, it is necessary to clean or replace the protective glass upon contamination. In this study, we demonstrate a large-area and flexible anti-reflective film with moth-eye pattern fabricated by using a highly straightforward process: nanoimprint lithography. In addition, the fabricated anti-reflective film exhibits self-cleaning capability owing to the hydrophobic self-assembled-monolayer-coated surface. The fabricated anti-reflective film was attached to the surface of photovoltaic (PV) modules and placed outdoor to conduct a seven-month field test in order to observe the increase in the conversion efficiency of the PV modules as a result of the effect of the anti-reflective film. Two types of patterns, moth-eye pattern and micro-cone pattern, were used as the anti-reflective patterns; these were conveniently fabricated by the ultraviolet-nanoimprint lithography process, which does not use vacuum or high-temperature process. In the seven-month analysis, the moth-eye patterned film was observed to exhibit a transmittance that is 5.0% higher than that of the flat film, whereas the PV module with the moth-eye patterned film on its surface exhibited a conversion efficiency that is 2.85% higher than that of the PV module with the flat film.
关键词： Field test,Long-term,Moth-eye,Anti-reflective,Nanoimprint lithography
更新于2025-09-23 15:23:52
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22.3: Low cost fabrication of high contrast ratio and high transmission wire grid polarizer by nanoimprint lithography
摘要： This paper proposes a novel approach for low cost fabrication of large area wire grid polarizer (WGP). WGPs regarded as one potential alternative to traditional rear polarizer and DBEF possess the advantages of large contrast ratio (CR), high transmission. To date WGPs can be fabricated through electron beam direct write, which is slow and expensive, therefore not suitable for large area application. With the development of nano-fabrication methods, for instance, nanoimprint lithography (NIL), large area WGP can be made at low cost and fast speed. Furthermore, flexible polarizer can also be made through roll-to-roll (R2R) NIL. In this paper, a WGP with high TM transmission of around 85% and low TE transmission down to 0.2% through the visible light spectra will be realized through nanofabrication. The contrast ratio of the WGP can reach >450 with peak value >3000. For the fabrication process, atom layer deposition (ALD) will be utilized to prepare imprint mask which can achieve highly precise control of expected structure. In this paper, characterization of the designed WGP will also be narrated in the back part, including transmission, CR and the SEM schematic diagram. We believe that low cost fabrication method shows the potential to be adopted for industrial fabrication of polarizer in the future.
关键词： atom layer deposition (ALD),large area fabrication,low cost fabrication,wire grid polarizer (WGP),high contrast ratio,nanoimprint lithography (NIL),high TM transmission
更新于2025-09-23 15:22:29
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Feasibility Analysis of Nanostructured Planar Focusing Collectors for Concentrating Solar Power Applications
摘要： Concentrating solar power (CSP) technology is an attractive approach to harvesting solar energy. Unlike photovoltaic (PV) technology, thermal storage is used in lieu of batteries for electricity generation. However, the cost of current collection optics in a CSP plant hampers commercial competitiveness with PVs and natural gas. The use of a planar focusing collector (PFC) could help reduce cost of materials, installation, and maintenance. We present two candidate PFC designs, one based on metasurfaces and the other a Fresnel-like model. We feed each design through the entire system process—design, fabrication, scalability, and techno-economic feasibility—and discuss the challenges met at each stage. Two-photon and nanoimprint lithography are used to make PFC molds and replicas, respectively. We find that the annual optical efficiency for the Fresnel-based PFC is ~40%--higher than the current 30% target for natural gas, thereby suggesting potential economic advantages in the market of industrial process heat.
关键词： Metasurface,Two-Photon Lithography,Concentrating Solar Power (CSP),Planar Focusing Collector (PFC),Nanoimprint Lithography
更新于2025-09-23 15:21:01
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Transparent colored display enabled by flat glass waveguide and nanoimprinted multi-layer gratings
摘要： In this paper, a type of transparent colored static display consisting of a flat glass waveguide and embedded multi-layer gratings is presented, by which multiple patterns and colors with a wide field of view (FOV) can be displayed. The embedded grating is achieved by nanoimprinting followed by deposition of a high refractive index dielectric layer. The process can be repeated to produce multi-layer gratings, which are shaped into specific patterns to be displayed, and they are designed to have proper periods and orientations to independently extract light incident from different edges of the glass plate. Such transparent display offers the advantages of low cost, easy fabrication and wide FOV, and it is suitable for colored signage and decorative applications.
关键词： multi-layer gratings,transparent display,waveguide display,nanoimprint lithography,multi-color display
更新于2025-09-23 15:21:01
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Thermal degradation behavior of self-assembled monolayer surfactant on silicon substrate
摘要： In nanoimprint lithography, a release agent on the mold surface is usually necessary for easy demolding between the mold and the imprinted (thermal) resist. In this work, the thermal stability of 1H,1H,2H,2H-perfluorodecyltrichlorosilane (FDTS) monolayers is studied using x-ray photoelectron spectroscopy. The FDTS monolayers are deposited on Si (100) substrates via vapor phase reactions. Significant fluorine desorption of the monolayers is observed for samples annealed at 250 and 300 °C in air. The fluorine coverage decreases as a function of annealing time at a given annealing temperature. The desorption is proposed to be dependent on the monolayer packing details and may be influenced by the intermolecular heat transfer. Removal of the CF3 groups is found to be faster than that of the CF2 group as evidenced by the CF2/CF3 peak area ratios that increase with the annealing time. Sessile drop water contact angle and fluorine coverage evolution results show that the estimated useful coating lifetime is 180 min when the samples are annealed at 300 °C and ～560 min when annealed at 250 °C. The peak position of the binding energy of the F 1s spectral line is related to the monolayer fluorine coverage and it may be a result of the interactions between the molecular chain and the negatively charged silicon substrate. Furthermore, nearly no chain desorption is detected for samples annealed in an inert environment, which may be attributed to the elimination of reactive oxygen and moisture molecules. The thermal degradation behaviors in ambient and inert atmosphere provide useful information for designing a nanoimprint process for the commercial manufacturing of polymeric microstructure and nanostructure.
关键词： fluorine desorption,x-ray photoelectron spectroscopy,thermal stability,FDTS monolayers,nanoimprint lithography
更新于2025-09-23 15:21:01
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Highly Efficient Tandem White OLED Using a Hollow Structure
摘要： A simple fabrication method for a light extraction layer is required. In this report, an internal light extraction layer composed of a high refractive index material and an air void is fabricated in five steps. A direct printing process followed by annealing of the randomly arrayed poly(benzyl methacrylate) pillars after a planarization process using TiO2-nanoparticle dispersed resist and sol is used. These substrates are used for light extraction in white tandem organic light emitting diodes (WOLEDs). By combining the hollow structure and hemi-spherical lens, WOLEDs without and with the light extraction structures are found to show maximum external quantum efficiencies of 35.6% and 103%, respectively. The power efficiencies at 100 cd m?2 of the WOLEDs without and with the light extraction structures are found to be 26.5 and 93.2 lm W?1, respectively. A color rendering index of 86.4, correlated color temperature of 4860 K, and CIE of (0.353, 0.389) are achieved in the WOLEDs with light extraction structures.
关键词： organic light emitting diodes,high refractive index,light extraction efficiency,nanoimprint lithography,light scattering layers
更新于2025-09-23 15:19:57
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Multilevel nanoimprint lithography with a binary mould for plasmonic colour printing
摘要： Pigment-free colouration based on plasmonic resonances has recently attracted considerable attention for potential in manufacturing and other applications. For plasmonic colour utilizing the metal-insulator-metal (MIM) configuration, the generated colour is not only dependent on the geometry and transverse dimensions, but also to the size of the vertical gap between the metal nanoparticles and the continuous metal film. The complexity of conventional fabrication methods such as electron beam lithography (EBL), however, limits the capacity to control this critical parameter. Here we demonstrate the straightforward production of plasmonic colour via UV-assisted nanoimprint lithography (NIL) with a simple binary mould and demonstrate the ability to control this gap distance in a single print by harnessing the nanofluidic behaviour of the polymer resist through strategic mould design. We show that this provides a further avenue for controlling the colour reflected by the resulting plasmonic pixels as an adjunct to the conventional approach of tailoring the transverse dimensions of the nanostructures. Our experimental results exhibit wide colour coverage of the CIE 1931 XY colour space through careful control of both the length and periodicity and the resulting vertical gap size of the structure during the nanoimprinting process. Furthermore, to show full control over the vertical dimension, we show that a fixed gap size can be produced by introducing complementary microcavities in the vicinity of the nanostructures on the original mould. This demonstrates a simple method for obtaining an additional degree of freedom in NIL not only for structural colouration but also for other industrial applications such as high-density memory, biosensors and manufacturing.
关键词： metal-insulator-metal,UV-assisted NIL,plasmonic colour,nanoimprint lithography,structural colouration
更新于2025-09-23 15:19:57
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Thermal nanoimprint lithography based plasmonic nanogratings for refractive index sensing of polar solvents
摘要： This work illustrates a facile approach for the design of flexible plasmonic sensors using gold nanograting. The fabrication of surface plasmon resonance (SPR) coupled refractive index (RI) sensor is proposed to sense the various known RIs of polar solvents. Thermal nanoimprint lithography (T-NIL) is used to transfer the nanograting of the processed digital versatile discs (DVDs) through polydimethylsiloxane (PDMS) stamp to thermoplastic polymer coated flexible polyethylene terephthalate (PET) substrate. The gold nanograting sample was obtained after the subsequent deposition of the gold thin film of thickness 60 nm on top of polymer nanograting. The surface plasmon resonance (SPR) modes excited on gold-encrusted polymer nanograting appeared as a dip in the reflectance spectra measured at normal incidence under white light in air and liquid medium. We use refractive index calibration polar solvents [methanol (1.331), water (1.333), acetone (1.359), ethanol (1.361) and isopropanol (1.382)] to determine the refractive index sensitivity of our gold nanograting arrays. This produces a bulk refractive index sensitivity of 535 ± 47 nm/RIU. The real-time kinetic response demonstrates the stability of the sensor with respect to the time and reusability of the sensing chip for multiple measurements. Thus, we envisaged that our proposed sensor can be a potential candidate for the development of highly sensitive plamonic device.
关键词： Nanogratings,surface plasmon resonance (SPR),Thermal nanoimprint lithography (T-NIL),Plasmonic sensor,Polar solvents
更新于2025-09-23 15:19:57