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Evaluation of fluences and surface characteristics in laser polishing SKD 11 tool steel
摘要： In this paper, a continuous-wave laser beam from a multimode fiber laser was applied to study the polishing effect. Three kinds of surface morphologies were acquired by fast-speed (FS) & lower-speed (LS) wire electrical discharge machining (EDM), milling processing methods on SKD11 tool steel. Then influence of laser fluence on the polished surface characteristics was analyzed. The results showed that surface roughness parameters (Ra, Rz, Rt, and Sa) can be significantly affected by this effect. With laser fluence increasing, the polished surface underwent a comprehensive topographical evolution from superficial surface melting to surface over-melting. The improvements by FS-EDM, LS-EDM, and milling in roughness were 86.83%, 90.70% and 86.07%, respectively. The corresponding laser fluences were 14.26 J/mm2, 12.73 J/mm2 and 13.55 J/mm2, indicating that LS-EDM tool steel surface has the best polishing effect. The comparative statistical results of the bearing area curve, bidirectional reflectance distribution function, and power spectral density from the LS-EDM surfaces showed the best polishing results. In addition, all the pre-prepared surfaces could be polished to Ra < 0.5 μm using high polishing velocities. These findings also signified that laser beam with top-hat distribution has a great potential for high-efficiency polishing of tool steel surfaces.
关键词： Power spectral density,Surface morphology,Bearing area curve,Fluence,Laser polishing,Tool steel
更新于2025-11-28 14:24:20
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Preparation of ellipsoidal rod-shaped silica nanocomposite abrasives by Chromium ion/PEG200 induced method for sapphire substrates chemical mechanical polishing
摘要： Abrasive is vital to sapphire substrates chemical mechanical polishing and provides the most critical support for ?attening of sapphire. This work proposed a method to prepare ellipsoidal rod-shaped silica nanocomposite abrasives in order to increase the material removal rate and improve the surface roughness, which were applied to chemical mechanical polishing on sapphire substrates. Ellipsoidal rod-shaped silica nanocomposite abrasives were prepared by Chromium ion/PEG200 induced method. In this work, the synthesis process of ellipsoidal rod-shaped silica nanocomposite abrasives was discussed. As an inducing agent, Chromium compounds were bonded with two SiO2 particles via chemical bonds. And ellipsoidal rod-shaped silica nanocomposite abrasives were coated by PEG200 via hydrogen bonds. Results from X-ray photoelectron spectroscopy and time-of-?ight secondary ion mass spectroscopy revealed the occurrence of solid-state chemical reactions. The contact angle tests indicated the polishing liquid containing ellipsoidal rod-shaped silica nanocomposite abrasives had a good wettability. Ellipsoidal rod-shaped silica nanocomposite abrasives showed an excellent chemical mechanical polishing performance with a higher material removal and a lower surface roughness due to an excellent combination of chemical effect and mechanical effect occurred between ellipsoidal rod-shaped silica nanocomposite abrasives and sapphire substrates. A material removal model was built to describe the polishing behavior of ellipsoidal rod-shaped silica nanocomposite abrasives.
关键词： Polishing mechanism,Sapphire substrates,Ellipsoidal rod-shaped silica nanocomposite abrasives,Chemical mechanical polishing
更新于2025-11-14 15:27:09
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Interaction between Debris Particles and Polishing Powder Wear Particles in Polishing Optoelectronic Components
摘要： The analysis of interaction between debris particles and polishing powder wear particles has demonstrated that the scattering of particles occurs through angles of 136.8° to 173.2°, and the effective differential scattering cross-section is 0.4 to 1.8 Tb. The trajectories of particles are rings located near the workpiece surface within a zone whose thickness approximates the mean grain radius of the polishing powder.
关键词： scattering cross-section,polishing powder wear particles,scattering angle,debris particles
更新于2025-09-23 15:23:52
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Fundamental Investigation on the Polishing Aspheric Elements with Doughnut-Shaped MCF Slurry
摘要： Previous researches have confirmed that MCF (magnetic compound fluid) slurry shows outstanding performance in the Nano-precision polishing of flat surfaces and V-grooves. However, no investigations have been conducted on the polishing of aspheric surfaces using MCF slurry. In this work, a novel method employing a doughnut-shaped MCF polishing tool and a 6-DOF manipulator has been proposed for the aspheric surface polishing. The time consumption for forming stable polishing tool and its final appearance are investigated. Flat aluminum alloy workpieces that can be considered as a kind of aspheric elements with infinite curve radius were adopted in the investigation of the polished forces under variable parameters. As a typical experimental result, with MCF3 slurry, 2.5ml volume of supplied slurry and work gap 3.5 mm, the surface roughness Ra decreases from 125nm to almost 10nm after 90 min polishing, confirming that the proposed method has the potential to polish aspheric surfaces.
关键词： Aspheric surface,Manipulator,Polishing,MCF slurry
更新于2025-09-23 15:23:52
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Effect of multi stage abrasive slurry jet polishing on surface generation in glass
摘要： The polishing process is used to produce a smooth surface with a required geometrical figure for the optical component. The abrasive slurry jet polishing process is one of the non-traditional polishing process, which is used to polish freeform optics with the nano-level surface finish. In the abrasive slurry jet polishing process, the saturation in surface roughness is observed with a jet exposure time or polishing time. Once the saturation limit is reached a further reduction in surface roughness without the modification of processing conditions and the size of the abrasive particles is not possible. Hence to achieve the required surface roughness a different polishing strategy has to be adapted. In this work, an attempt was carried out to yield a considerable reduction in surface roughness using a multistage polishing concept. In this concept, the impact angle, the traverse speed of the nozzle, the type and size of the abrasive particle were changed after the first stage of polishing. The surface generation has been studied by measuring the surface roughness at each stage of polishing, and the Scanning Electron Microscope (SEM) analyses have been done to understand the changes in surface texture, after polishing. From the experiments, the large size Al2O3 particle in the first stage of polishing and then small size Al2O3 particle in the remaining stages of polishing yields a considerable reduction in surface roughness. The combination of parameters with the type and size of the abrasive particles to be used to achieve the required surface characteristics were demonstrated. Thus, the multistage polishing concept can be floated as a viable strategy to achieve a high reduction in surface roughness on the optical component.
关键词： Abrasive,Particle size,Traverse speed,Slurry,Multistage Polishing,Glass
更新于2025-09-23 15:23:52
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Novel polyelectrolyte–Al2O3/SiO2 composite nanoabrasives for improved chemical mechanical polishing (CMP) of sapphire
摘要： A new type of polyelectrolyte–Al2O3/SiO2 composite nanoparticle with excellent dispersibility and superior polishing performance was successfully fabricated using a facile method. Silica acted as a bifunctional molecule by attaching to alumina via covalent bond and adsorbing polyelectrolytes by electrostatic interaction. The material removal rate of the polyelectrolyte–Al2O3/SiO2 abrasive was 30% higher than that of the pure Al2O3 abrasive. In addition, the sapphire surface was much smoother. The material removal mechanism was investigated during CMP using the microcontact and wear model. The enhanced removal rate was mainly attributed to the well-dispersed particles, which can accelerate mechanical removal process. The remarkably smooth surface was due to the decrease in penetration depth of the abrasive into the wafer. The results of this study provided a feasible strategy to satisfy the high efficiency and damage-free polishing requirements for sapphire planarization.
关键词： chemical mechanical polishing,composite abrasives,polyelectrolyte,surface roughness,sapphire,material removal rate
更新于2025-09-23 15:22:29
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On the predictive modelling of machined surface topography in abrasive air jet polishing of quartz glass
摘要： Abrasive Air Jet Polishing (AAJP) process can be considered as one of the most promising ultra-high-precision finishing methods of quartz glass products due to the superior machined surface integrity, and the high machining feasibility for free-form surfaces. Although many academic and engineering efforts have been paid so far to AAJP process from the theoretical, numerical and experimental aspects, most of the available studies have considered neither (i) the stochastic nature of the abrasive sizes nor (ii) the elastic springback after the impacting abrasives bounced back from the workpiece surface. To fill this gap, this paper proposes the predictive model of the machined surface topography in the AAJP process of quartz glass. A series of experimental trials are performed as well which to a large extent proved the model feasibility and accuracy, and, more importantly, the necessity to consider the normally-distributed abrasive sizes, the stochastic abrasive distribution within the spray airflow, and the elastic workpiece deformation recovery after the AAJP process. Both the experimental and theoretical results also conclude that the small-sized abrasives and the low jet airflow pressure were more effective to achieve the smooth surfaces. The proposed model in this work is expected to be not only helpful to provide the theoretical foundation to study more in-depth mechanism of the AAJP process of brittle materials, but also meaningful to guide the industrial manufacturing in terms of machining parameter optimisation and machined surface quality prediction.
关键词： Elastic springback,Stochastic abrasive size,Plastic deformation,Machined surface topography,Abrasive air jet polishing
更新于2025-09-23 15:22:29
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Experimental Optimization of Annular Polishing Parameters for Silicon Carbide
摘要： Machined surface quality has a strong impact on the functionality of silicon carbide-based components and devices. In the present work, we ?rst analytically investigate the complex coupling of motions in annular polishing based on the Preston equation, which derives the in?uential parameters for material removal. Subsequently, we conduct systematic annular polishing experiments of reaction-bonded silicon carbide to investigate the in?uence of derived parameters on polished surface quality, which yield optimized polishing parameters for achieving ultralow surface roughness of reaction-bonded silicon carbide.
关键词： silicon carbide,polishing parameters,annular polishing,Preston equation,surface roughness
更新于2025-09-23 15:21:21
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Electrochemical Polishing of Two-Dimensional Materials
摘要： Two-dimensional (2D) layered materials demonstrate their exquisite properties such as high temperature superconductivity, superlubricity, charge density wave, piezotronics, flextronics, straintronics, spintronics, valleytronics, and optoelectronics, mostly, at the monolayer limit. Following initial breakthroughs based on micromechanically exfoliated 2D monolayers, significant progress has been made in recent years towards the bottom-up synthesis of large-area monolayer 2D materials such as MoS2 and WS2 using physical vapor deposition (PVD) and chemical vapor deposition (CVD) techniques in order to facilitate their transition into commercial technologies. However, the nucleation and subsequent growth of the secondary, tertiary, and greater numbers of vertical layers poses a significant challenge not only towards the realization of uniform monolayers, but also to maintain their consistent electronic and optoelectronic properties which change abruptly when transitioning from the monolayer to multilayer form. Chemical or physical techniques which can remove the unwarranted top layers without compromising the material quality will have tremendous consequence towards the development of atomically flat, large-area, uniform monolayers of 2D materials. Here, we report a simple, elegant, and self-limiting electrochemical polishing technique which can thin down any arbitrary thickness of 2D material, irrespective of whether these are obtained using powder vapor transport (PVT) or mechanical exfoliation, into their corresponding monolayer form at room temperature within a few seconds without compromising their atomistic integrity. The effectiveness of this electrochemical polishing technique is inherent to 2D transition metal dichalcogenides (TMDCs) owing to the stability of their basal planes, enhanced edge reactivity, and stronger-than-van der Waals (vdW) interaction with the substrate. Our study also reveals that 2D monolayers are chemically more robust and corrosion resistant compared to their bulk counterparts in similar oxidative environments which enables electrochemical polishing of such materials down to a monolayer.
关键词： physical vapor transport,MoS2,WS2,monolayer,corrosion,two-dimensional (2D) materials,electrochemical polishing,electro-ablation
更新于2025-09-23 15:21:21
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[Micro/Nano Technologies] Micro and Nano Fabrication Technology Volume 1 || Bonnet Polishing of Microstructured Surface
摘要： Microstructured surfaces have been adopted in various and wide applications. Different types of microstructures made of ductile materials can be generated by cutting process, for example, turning and milling with speci?ed diamond cutters. However, these processes generally are not capable to handle with hard and brittle materials which are called dif?cult-to-machine materials. Computer-controlled ultra-precision polishing with bonnet provides an enabling solution to generate microstructures due to its feasible in?uence function. With proper machining parameters, speci?ed shape of the tool in?uence function is hence obtained, and then with aid of tool path planning, microstructured surface topography is generated, especially for those dif?cult-to-machine materials. In this chapter, research work for generating microstructured surface by computer-controlled ultra-precision bonnet polishing is presented. The material removal characteris- tics and tool in?uence function of bonnet polishing are explained, and a multi- scale material removal model and a surface generation model were developed. Surface generation of microstructures by single precess polishing and swing precess polishing is explained in details. A series of simulation and real polishing experimental studies are undertaken based on a seven-axis ultra-precision freeform polishing machine. The generated microstructured surfaces with various patterns have been analyzed. The research results have demonstrated that the proposed bonnet polishing provides an enabling and effective approach for generating microstructured surfaces.
关键词： Modelling,Bonnet polishing,Ultra-precision machining,Dif?cult-to- machine material,Precess polishing,Surface generation,In?uence function,Computer controlled polishing,Microstructured surface,Multi-scale material removal,Simulation
更新于2025-09-23 15:21:01