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- 实验方案
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High-Precision 3D Object Capturing with Static and Kinematic Terrestrial Laser Scanning in Industrial Applicationsa??Approaches of Quality Assessment
摘要： Terrestrial laser scanning is used in many disciplines of engineering. Examples include mobile mapping, architecture surveying, archaeology, as well as monitoring and surveillance measurements. For most of the mentioned applications, 3D object capturing in an accuracy range of several millimeters up to a few centimeters is sufficient. However, in engineering geodesy, particularly in industrial surveying or monitoring measurements, accuracies in a range of a few millimeters are required. Additional increased quality requirements apply to these applications. This paper focuses on the quality investigation of data captured with static and kinematic terrestrial laser scanning. For this purpose, suitable sensors, which are typically used in the approach of a multi-sensor-system, as well as the corresponding data capturing/acquisition strategies, are presented. The aim of such systems is a geometry- and surface-based analysis in an industrial environment with an accuracy of +/? 1–2 mm or better.
关键词： synchronization,quality analysis,laser tracker,high-precision terrestrial laser scanning,multi-sensor-systems,calibration,industrial surveying,kinematic laser scanning,forward modeling,backward modeling
更新于2025-09-23 15:19:57
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Ultrapurewater for Cleaning Wafers in Semiconductor Manufacturing; 半導体洗浄のための超純水;
摘要： Ultrapurewater is essentially used in wet processes of semiconductor manufacturing in order to rinse out impurities on wafers and to prepare chemical solutions for wafer cleaning. The quality requirement for the ultrapurewater is getting higher along with the advance of semiconductor devices. The quality load map with analytical control items, puri?cation facilities and production system of the ultrapurewater are overviewed. The achievements in the technologies of reducing a trace amount of ?ne particles and metal impurities, which would particularly cause yield reductions by the wafer contaminations, are described. In addition, the recent works on hydrogen peroxide in the ultrapurewater is described as well.
关键词： metal,ultrapurewater,water quality analysis,particle,hydrogen peroxide
更新于2025-09-19 17:15:36