- 标题
- 摘要
- 关键词
- 实验方案
- 产品
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The Monte Carlo Simulation of Secondary Electrons Excitation in the Resist PMMA
摘要： The Monte Carlo method was used to simulate the process of secondary electrons excitation in resist PMMA with Mott cross section and dielectric function model. By analyzing the characteristics of secondary electrons excitation in the resist PMMA, and the simulation of secondary electrons energy range, we hold the opinion that the secondary electrons can not be ignored in the electron beam lithography.
关键词： Monte Carlo simulation,electron beam lithography (EBL),dielectric function,secondary electrons
更新于2025-09-23 15:23:52
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[IEEE 2018 31st International Vacuum Nanoelectronics Conference (IVNC) - Kyoto, Japan (2018.7.9-2018.7.13)] 2018 31st International Vacuum Nanoelectronics Conference (IVNC) - Spin resolved Imaging with Scanning Field-Emission Microscopy
摘要： Secondary electrons emitted from a scanning field-emission microscope are spin analyzed with a Mott detector. Spin polarization up to 15% is observed with a lateral resolution of less than 5 nm, with a potential resolution of even less than 1 nm. In this paper the proof of principle is conducted by comparing this method with a well-established method of spin mapping and with reference samples examined by these two microscopes.
关键词： Secondary Electrons,Magnetic Imaging,Electron Microscopy,Field Emission
更新于2025-09-23 15:21:21
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Pilot capability evaluation of a feedback electronic imaging system prototype for in-process monitoring in electron beam additive manufacturing
摘要： Electron beam additive manufacturing (EBAM) is an additive manufacturing (AM) technique increasingly used by many industrial sectors, including medical and aerospace industries. The application of this technology is still, however, challenged by many technical barriers. One of the major issues is the lack of process monitoring and control system to monitor process repeatability and component quality reproducibility. Various techniques, mainly involving infrared (IR) and optical cameras, have been employed in previous attempts to study the quality of the EBAM process. However, all attempts lack the flexibility to zoom-in and focus on multiple regions of the processing area. In this paper, a digital electronic imaging system prototype and a piece of macroscopic process quality analysis software are presented. The prototype aims to provide flexibility in magnifications and the selection of fields of view (FOV). The software aims to monitor the EBAM process on a layer-by-layer basis. Digital electronic images were generated by detecting both secondary electrons (SE) and backscattered electrons (BSE) originating from interactions between the machine electron beam and the processing area using specially designed hardware. Prototype capability experiments, software verification and demonstration were conducted at room temperature on the top layer of an EBAM test build. Digital images of different magnifications and FOVs were generated. The upper range of the magnification achieved in the experiments was 95 and the demonstration verified the potential ability of the software to be applied in process monitoring. It is believed that the prototype and software have significant potential to be used for in-process EBAM monitoring in many manufacturing sectors. This study is thought to be the necessary precursor for future work which will establish whether the concept is suited to working under in-process EBAM operating conditions.
关键词： In-process monitoring,Electron beam melting,Electronic imaging,Metallic materials,Additive manufacturing,Quality control,Backscattered electrons,Secondary electrons
更新于2025-09-10 09:29:36
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AN ALGORITHM TO DETERMINE THE NANODOSIMETRIC IMPACT OF GOLD NANOPARTICLES ON CELL MODELS
摘要： High-Z nanomaterials, e.g. gold nanoparticles (GNPs), are being investigated worldwide for potential application in radiation imaging and therapy. Photon irradiation of cells containing GNP was shown to produce enhanced DNA damage which is believed to be related to the increased secondary electron (SE) yield and ionization density. In this work, an algorithm was developed for simulating the physical radiation damage inside the nucleus of a spherical cell model for the case of uniformly distributed GNPs within the cytoplasm. Previously calculated energy spectra of SE emerging from a single NP irradiated with different photon sources are used as input to obtain the SE energy spectrum at the surface of the cell nucleus. In a second step, the SE transport inside the cell nucleus is simulated with a track structure Monte Carlo code to obtain the spatial distribution of ionizations. The preliminary results presented here show that the developed algorithm allows for a fast calculation of the SE spectra at the cell nucleus surface, thus enabling a more realistic assessment of the ionization density inside the cell nucleus than that obtained by the simulation of a single GNP. Furthermore, the algorithm can be easily adapted to investigate both the effect of GNP clustering and the impact of GNP–GNP interactions on SE spectra.
关键词： radiation therapy,secondary electrons,gold nanoparticles,Monte Carlo simulation,ionization density
更新于2025-09-04 15:30:14